Study of Si Nanowire Surface Cleaning

2019 ◽  
Vol 92 (2) ◽  
pp. 13-19
Author(s):  
Shota Iwahata ◽  
Yukifumi Yoshida ◽  
Kana Komori ◽  
Dennis H. van Dorp ◽  
Kurt Wostyn ◽  
...  

2008 ◽  
Vol 39 (3-4) ◽  
pp. 507-511 ◽  
Author(s):  
A.I. Diaz Cano ◽  
T.V. Torchynska ◽  
J.E. Urbina-Alvarez ◽  
G.R. Paredes Rubio ◽  
S. Jiménez Sandoval ◽  
...  

2006 ◽  
Vol 963 ◽  
Author(s):  
Loucas Tsakalakos ◽  
Jody Fronheiser ◽  
Larry Rowland ◽  
Mohamed Rahmane ◽  
Michael Larsen ◽  
...  

ABSTRACTPolycrystalline SiC nanowires and composite Si nanowire-SiC nanograin structures have been synthesized using a combined catalytic chemical vapor deposition and carburization method. Si nanowires are grown at low temperature (550-650 C) and subsequently carburized at 1100-1200 C in a methane/hydrogen or propane/hydrogen environment. Thermochemical calculations showed that the Si carburization is thermodynamically favorable over a wide tempareture range, whereas our studies showed that the Si nanowire carburization is kinetically limited below ∼1100 °C. Partially carburized nanowires contained distinct SiC nanosized grains on the Si nanowire surface, whereas fully carburized nanowires were polycrystalline 3C SiC with grain sizes of ∼ 50-100 nm.


Author(s):  
C.M. Sung ◽  
M. Levinson ◽  
M. Tabasky ◽  
K. Ostreicher ◽  
B.M. Ditchek

Directionally solidified Si/TaSi2 eutectic composites for the development of electronic devices (e.g. photodiodes and field-emission cathodes) were made using a Czochralski growth technique. High quality epitaxial growth of silicon on the eutectic composite substrates requires a clean silicon substrate surface prior to the growth process. Hence a preepitaxial surface cleaning step is highly desirable. The purpose of this paper is to investigate the effect of surface cleaning methods on the epilayer/substrate interface and the characterization of silicon epilayers grown on Si/TaSi2 substrates by TEM.Wafers were cut normal to the <111> growth axis of the silicon matrix from an approximately 1 cm diameter Si/TaSi2 composite boule. Four pre-treatments were employed to remove native oxide and other contaminants: 1) No treatment, 2) HF only; 3) HC1 only; and 4) both HF and HCl. The cross-sectional specimens for TEM study were prepared by cutting the bulk sample into sheets perpendicular to the TaSi2 fiber axes. The material was then prepared in the usual manner to produce samples having a thickness of 10μm. The final step was ion milling in Ar+ until breakthrough occurred. The TEM samples were then analyzed at 120 keV using the Philips EM400T.


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