scholarly journals Design of Pixellated CMOS Photon Detector for Secondary Electron Detection in the Scanning Electron Microscope

2011 ◽  
Vol 2011 ◽  
pp. 1-7 ◽  
Author(s):  
Joon Huang Chuah ◽  
David Holburn

This paper presents a novel method of detecting secondary electrons generated in the scanning electron microscope (SEM). The method suggests that the photomultiplier tube (PMT), traditionally used in the Everhart-Thornley (ET) detector, is to be replaced with a configurable multipixel solid-state photon detector offering the advantages of smaller dimension, lower supply voltage and power requirements, and potentially cheaper product cost. The design of the proposed detector has been implemented using a standard 0.35 μm CMOS technology with optical enhancement. This microchip comprises main circuit constituents of an array of photodiodes connecting to respective noise-optimised transimpedance amplifiers (TIAs), a selector-combiner (SC) circuit, and a postamplifier (PA). The design possesses the capability of detecting photons with low input optical power in the range of 1 nW with 100 μm × 100 μm sized photodiodes and achieves a total amplification of 180 dBΩ at the output.

2011 ◽  
Vol 17 (S2) ◽  
pp. 1212-1213 ◽  
Author(s):  
J Chuah ◽  
D Holburn

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.


2014 ◽  
Vol 215 ◽  
pp. 459-461
Author(s):  
Alexander S. Samardak ◽  
Margarita V. Anisimova ◽  
Alexey V. Ognev ◽  
Vadim Yu. Samardak ◽  
Liudmila A. Chebotkevich

We present a novel method of pattern nanofabrication with high resolution and small shape defects using the traditional electron-beam lithography (EBL) or only a scanning electron microscope (SEM). Our method of Spot EBL is extremely fast, highly scalable on big areas, capable of sub-20 nm resolution and fabrication of polymer patterns with complicated shapes. We show the nanostructure images fabricated by Spot EBL and propose practical applications of the novel method.


1995 ◽  
Vol 68 (2) ◽  
pp. 342-350 ◽  
Author(s):  
Paul E. F. Cudby ◽  
Barry A. Gilbey

Abstract A novel method for carrying out scanning transmission electron microscopy on a standard scanning electron microscope is described. This method involves the addition of a specially fabricated mount and is accomplished without carrying out any form of modification on the microscope. The method is compared to more conventional microscopy techniques and examples are given showing the advantages of this system.


2012 ◽  
Vol 18 (S2) ◽  
pp. 1222-1223 ◽  
Author(s):  
J. Chuah ◽  
D. Holburn

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.


2006 ◽  
Vol 12 (S02) ◽  
pp. 1530-1531 ◽  
Author(s):  
T Williams ◽  
F Bailey

Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2005


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