Novel method for dimensional measurements of nanorelief elements based on electron probe defocusing in a scanning electron microscope

2014 ◽  
Vol 25 (4) ◽  
pp. 044008 ◽  
Author(s):  
M N Filippov ◽  
V P Gavrilenko ◽  
V B Mityukhlyaev ◽  
A V Rakov ◽  
P A Todua
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
Dimensional Measurements ◽  
Novel Method ◽  
Scanning Electron

High Resolution Scanning Electron Microscopy

1991 ◽  
Vol 49 ◽  
pp. 478-479
Author(s):  
David Joy ◽  
James Pawley
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
Impact Point ◽  
Interaction Volume ◽  
Scanning Electron

The scanning electron microscope (SEM) builds up an image by sampling contiguous sub-volumes near the surface of the specimen. A fine electron beam selectively excites each sub-volume and then the intensity of some resulting signal is measured. The spatial resolution of images made using such a process is limited by at least three factors. Two of these determine the size of the interaction volume: the size of the electron probe and the extent to which detectable signal is excited from locations remote from the beam impact point. A third limitation emerges from the fact that the probing beam is composed of a finite number of discrete particles and therefore that the accuracy with which any detectable signal can be measured is limited by Poisson statistics applied to this number (or to the number of events actually detected if this is smaller).

Spot Electron-Beam Lithography as a Novel Method of High Resolution Pattern Nanofabrication

2014 ◽  
Vol 215 ◽  
pp. 459-461
Author(s):  
Alexander S. Samardak ◽  
Margarita V. Anisimova ◽  
Alexey V. Ognev ◽  
Vadim Yu. Samardak ◽  
Liudmila A. Chebotkevich
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Electron Beam Lithography ◽  
The Novel ◽  
Practical Applications ◽  
Novel Method ◽  
20 Nm ◽  
Scanning Electron

We present a novel method of pattern nanofabrication with high resolution and small shape defects using the traditional electron-beam lithography (EBL) or only a scanning electron microscope (SEM). Our method of Spot EBL is extremely fast, highly scalable on big areas, capable of sub-20 nm resolution and fabrication of polymer patterns with complicated shapes. We show the nanostructure images fabricated by Spot EBL and propose practical applications of the novel method.

Determination of the diameter of the electron probe of a scanning electron microscope

1993 ◽  
Vol 36 (12) ◽  
pp. 1348-1350
Author(s):  
Yu. A. Novikov ◽  
A. V. Rakov ◽  
I. Yu. Stekolin ◽  
I. B. Strizhkov
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
Scanning Electron

scholarly journals Design of Pixellated CMOS Photon Detector for Secondary Electron Detection in the Scanning Electron Microscope

2011 ◽  
Vol 2011 ◽  
pp. 1-7 ◽  
Author(s):  
Joon Huang Chuah ◽  
David Holburn
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Supply Voltage ◽  
Optical Power ◽  
Cmos Technology ◽  
Photon Detector ◽  
Transimpedance Amplifiers ◽  
Electron Detection ◽  
Novel Method ◽  
Scanning Electron

This paper presents a novel method of detecting secondary electrons generated in the scanning electron microscope (SEM). The method suggests that the photomultiplier tube (PMT), traditionally used in the Everhart-Thornley (ET) detector, is to be replaced with a configurable multipixel solid-state photon detector offering the advantages of smaller dimension, lower supply voltage and power requirements, and potentially cheaper product cost. The design of the proposed detector has been implemented using a standard 0.35 μm CMOS technology with optical enhancement. This microchip comprises main circuit constituents of an array of photodiodes connecting to respective noise-optimised transimpedance amplifiers (TIAs), a selector-combiner (SC) circuit, and a postamplifier (PA). The design possesses the capability of detecting photons with low input optical power in the range of 1 nW with 100 μm × 100 μm sized photodiodes and achieves a total amplification of 180 dBΩ at the output.

Scanning Transmission Imaging of Elastomer Blends Using an Unmodified Conventional Scanning Electron Microscope

1995 ◽  
Vol 68 (2) ◽  
pp. 342-350 ◽  
Author(s):  
Paul E. F. Cudby ◽  
Barry A. Gilbey
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Scanning Transmission Electron Microscopy ◽  
Transmission Imaging ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
Novel Method ◽  
Conventional Microscopy ◽  
Microscopy Techniques ◽  
Scanning Electron

Abstract A novel method for carrying out scanning transmission electron microscopy on a standard scanning electron microscope is described. This method involves the addition of a specially fabricated mount and is accomplished without carrying out any form of modification on the microscope. The method is compared to more conventional microscopy techniques and examples are given showing the advantages of this system.

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