scholarly journals Surface and Interface Analysis by X-ray Fluorescence

2011 ◽  
Vol 47 (11) ◽  
pp. 444-452 ◽  
Author(s):  
Kouichi TSUJI
Keyword(s):  
X Ray ◽  
Interface Analysis ◽  
Surface And Interface

scholarly journals Nano-scale Surface and Interface Analysis Using X-ray Spectromicroscopy Assisted by Measurement Informatics

2021 ◽  
Vol 64 (8) ◽  
pp. 382-389
Author(s):  
Naoka NAGAMURA ◽  
Tarojiro MATSUMURA ◽  
Kenji NAGATA ◽  
Shotaro AKAHO ◽  
Yasunobu ANDO
Keyword(s):  
X Ray ◽  
Interface Analysis ◽  
Surface And Interface ◽  
Nano Scale ◽  
Scale Surface

Surface and Interface Analysis of Thin-Film/Si(Substrate) Contacts by Sxes

1996 ◽  
Vol 448 ◽  
Author(s):  
C. Heck ◽  
M. Kusaka ◽  
M. Hirai ◽  
H. Nakamura ◽  
M. Iwami ◽  
...  
Keyword(s):  
Thin Film ◽  
Free Path ◽  
Energetic Electron ◽  
Mean Free Path ◽  
Si Substrate ◽  
X Ray ◽  
Interface Analysis ◽  
Surface And Interface ◽  
The Mean ◽  
Primary Electrons

AbstractA soft X-ray emission spectroscopy(SXES) study under an energetic electron irradiation has been applied to a nondestructive buried interface analysis of a thin-film(e.g., Cr)/Si(substrate) contact system, where the energy of primary electrons, Ep , is less than 20keV. An interesting point of this method is that we can have a specific signal for an element to be used as a finger print, otherwise it is difficult. By using this e-beam excited SXES, we can study an interface buried deep in a rather thick overlayer, e.g., more than a hundred of nm, which is due to the fact that a mean free path of a soft X-ray or an X-ray production depth is much larger than the mean free path of an energetic electron in solids. Electronic structural study of silicides by SXES is also shown.

Glow Discharge as a Tool for Surface and Interface Analysis

2006 ◽  
Vol 41 (3) ◽  
pp. 227-258 ◽  
Author(s):  
Thomas Nelis ◽  
Jozsef Pallosi
Keyword(s):  
Glow Discharge ◽  
Interface Analysis ◽  
Surface And Interface
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