Process Variability Aware Low Leakage Reliable Nano Scale Double-Gate-FinFET SRAM Cell Design Technique

2015 ◽  
Vol 10 (6) ◽  
pp. 810-817 ◽  
Author(s):  
Saurabh Khandelwal ◽  
Vishal Gupta ◽  
Balwinder Raj ◽  
R. D. Gupta
Author(s):  
Young Bok Kim ◽  
Yong-Bin Kim ◽  
Fabrizio Lombardi ◽  
Young Jun Lee

Sign in / Sign up

Export Citation Format

Share Document