Time Resolved Langmuir Probe Characterisation of Reactive Pulse Magnetron Sputtering of MgO Thin Films

2004 ◽  
Vol 20 (3) ◽  
pp. 163-166 ◽  
Author(s):  
F. Richter ◽  
T. Welzel ◽  
T. Dunger ◽  
H. Kupfer
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Langmuir Probe ◽  
Time Resolved ◽  
Pulse Magnetron ◽  
Reactive Pulse

Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

2014 ◽  
Vol 951 ◽  
pp. 104-108
Author(s):  
Xing Fa Zi ◽  
Rui Ming Liu ◽  
Qing Ye ◽  
Xin Zhu Shu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rate Ratio ◽  
Room Temperature ◽  
Single Phase ◽  
Optical Band Gap ◽  
Flow Rate Ratio ◽  
Pulse Magnetron ◽  
Sputtering Power ◽  
Reactive Pulse

N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target. Crystalline phases of thin films were controlled by adjusting N2/ O2flow rate ratio and sputtering power precisely during the sputtering process, and the single phase of Cu2O(111) thin films were obtained at room temperature. The thin films deposited at different sputtering powers were characteristics of 2D growth and the root mean square (RMS) of surface roughness of thin films gradually increased with the increasing of sputtering power. The optical band gap (Eg) of thin films were in the range 2.18-2.35 eV, and slightly decreased with increasing of sputtering power from 45 W to 90 W.

Effects of Substrate Temperature on Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

2014 ◽  
Vol 540 ◽  
pp. 25-29
Author(s):  
Xing Fa Zi ◽  
Wen Yang ◽  
Peng Zhi Yang ◽  
Rui Ming Liu ◽  
Xin Zhu Shu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Atmosphere Effect ◽  
Pulse Magnetron ◽  
Vis Spectroscopy ◽  
Structure Surface ◽  
Substrate Temperatures ◽  
Reactive Pulse

N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target in a mixture of N2、O2and Ar atmosphere. Effect of substrate temperature on structure, surface morphology and optical properties of thin films were investigated by XRD, AFM and UV-Vis spectroscopy. The results showed that the single-phase of Cu2O(111) thin films were grown for substrate temperature < 200°C. The thin films deposited under different substrate temperatures are characteristics of 2D growth. Moreover,the optical band gap Egof thin film was in the range 2.54-2.58eV, and slightly decreased with increasing of substrate temperatures from RT to 400°C.

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

2005 ◽  
Vol 200 (1-4) ◽  
pp. 967-971 ◽  
Author(s):  
D. Glöß ◽  
P. Frach ◽  
O. Zywitzki ◽  
T. Modes ◽  
S. Klinkenberg ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Pulse Magnetron ◽  
Titanium Dioxide Thin Films ◽  
Reactive Pulse

Interface Stress of Oxide Thin Films Produced by DC Pulse Magnetron Sputtering Deposition

2010 ◽  
Author(s):  
Kun-Hsien Lee ◽  
Chia-Chen Lee ◽  
Chien-Jen Tang ◽  
Cheng-Chung Jaing ◽  
His-Chao Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Interface Stress ◽  
Oxide Thin Films ◽  
Sputtering Deposition ◽  
Pulse Magnetron

Deposition of NiVOx thin films by pulse magnetron sputtering with various Ar/O2 ratios

2013 ◽  
Vol 529 ◽  
pp. 62-65 ◽  
Author(s):  
Ko-Wei Weng ◽  
Tai-Nan Lin ◽  
Jung-Jie Huang ◽  
Yu-Pei Huang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Pulse Magnetron

Time-resolved Langmuir probe investigation of hybrid high power impulse magnetron sputtering discharges

Vacuum ◽  
2013 ◽  
Vol 90 ◽  
pp. 176-181 ◽  
Author(s):  
Steffen Drache ◽  
Vitezslav Stranak ◽  
Ann-Pierra Herrendorf ◽  
Martin Cada ◽  
Zdenek Hubicka ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Langmuir Probe ◽  
Time Resolved ◽  
Probe Investigation

Relation between modulation frequency of electric power oscillation during pulse magnetron sputtering deposition of MoNx thin films

2018 ◽  
Vol 456 ◽  
pp. 789-796 ◽  
Author(s):  
Bartosz Wicher ◽  
Rafał Chodun ◽  
Katarzyna Nowakowska-Langier ◽  
Sebastian Okrasa ◽  
Marek Trzciński ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Electric Power ◽  
Modulation Frequency ◽  
Sputtering Deposition ◽  
Power Oscillation ◽  
Pulse Magnetron

Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films

2010 ◽  
Vol 108 (4) ◽  
pp. 043305 ◽  
Author(s):  
Vitezslav Stranak ◽  
Martin Cada ◽  
Zdenek Hubicka ◽  
Milan Tichy ◽  
Rainer Hippler
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
High Power ◽  
Time Resolved
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