A computer simulation study of point defects in diopside and the self-diffusion of Mg and Ca by a vacancy mechanism

1998 ◽  
Vol 62 (5) ◽  
pp. 599-606 ◽  
Author(s):  
Feridoon Azough ◽  
Robert Freer ◽  
Kate Wright ◽  
Robert Jackson

AbstractComputer simulation techniques have been used to investigate defect formation and the diffusion of Ca and Mg in diopside. It was found that isolated, non-interacting CaO and MgO Schottky defects had the lowest formation energies (3.66 and 3.97 eV respectively); oxygen Frenkel defects are the most favourable oxygen defects (formation energies 3.93 eV). Magnesium and calcium self-diffusion in the c-direction of diopside is easiest by a vacancy mechanism involving either direct jumps along the c-direction, or double jumps in the b-c plane. In the extrinsic regime, diffusion activation energies for Mg are predicted to be 9.82 eV (direct route) and 1.97 eV (double jump route); for Ca diffusion, activation energies are predicted to be 6.62 eV (direct route) and 5.63 eV (double jump route). If additional vacancies (oxygen or magnesium) are present in the vicinity of the diffusion path, Ca migration energies fall to 1.97–2.59 eV. At elevated temperatures in the intrinsic regime, diffusion activation energies of ⩾ 5.95 eV are predicted for Mg self-diffusion and 9.29–10.28 eV for Ca self-diffusion. The values for Ca diffusion are comparable with published experimental data. It is inferred that a divacancy mechanism may operate in diopside crystals.

1990 ◽  
Vol 216 ◽  
Author(s):  
M.A. Berding ◽  
A. Sher ◽  
A.-B. Chen

ABSTRACTNative point defects play an important role in HgCdTe. Here we discuss some of the relevant mass action equations, and use recently calculated defect formation energies to discuss relative defect concentrations. In agreement with experiment, the Hg vacancy is found to be the dominant native defect to accommodate excess tellurium. Preliminary estimates find the Hg antisite and the Hg interstitial to be of comparable densities. Our calculated defect formation energies are also consistent with measured diffusion activation energies, assuming the interstitial and vacancy migration energies are small.


1981 ◽  
Vol 15 (8) ◽  
pp. 951-956 ◽  
Author(s):  
R.W. Balluffi ◽  
Thomas Kwok ◽  
P.D. Bristowe ◽  
A. Brokman ◽  
P.S. Ho ◽  
...  

1979 ◽  
Vol 19 (2) ◽  
pp. 149-152 ◽  
Author(s):  
J. L. Campbell ◽  
C. W. Schulte

1981 ◽  
Author(s):  
R. W. Balluffi ◽  
T. Kwok ◽  
P. D. Bristowe ◽  
A. Brokman ◽  
P. S. Ho ◽  
...  

1991 ◽  
Vol 6 (1) ◽  
pp. 1-4 ◽  
Author(s):  
Miki Nomura ◽  
Sing-Yun Lee ◽  
James B. Adams

Vacancy diffusion along two different high-angle twist grain boundaries (Σ5 and Σ13) was studied using the Embedded Atom Method (EAM). Vacancy formation energies in all the possible sites were calculated and found to be directly related to the degree of coincidence with the neighboring crystal planes. Optimal migration paths and migration energies were determined and found to be very low. The activation energies for self-diffusion at the boundaries were found to be less than half of the bulk value.


2012 ◽  
Vol 1394 ◽  
Author(s):  
Faisal Yaqoob ◽  
Mengbing Huang

ABSTRACTWe report on diffusion behavior for ion implanted indium and silver atoms in ZnO crystals. Both In and Ag ions were implanted at room temperature at 7-10° relative to c-axis to avoid channeling effects during implantation. In ions were implanted at four different energies (40, 100, 200, and 350 keV, respectively) and doses (4.20×1013, 6.70×1013, 8.10×1013 and 3.10×1014 /cm2, respectively), resulting in a total dose of 5 ×1014 /cm2. For another set of ZnO samples, Ag ions were implanted at energies 30, 75, 150, and 350 keV at doses 3.3×1013, 4.2×1013, 8.3×1013 and 3.4×1014 /cm2, respectively, to reach a total dose of 5×1014 /cm2. Both In and Ag implants resulted in a uniform concentration profile of the implanted dopants from surface to depth ~ 150 nm. The samples were annealed for 30 minutes at temperatures between 850-1050 °C in an oxygen gas flow. The distributions of In and Ag atoms, either aligned or nonaligned along the crystalline directions, were measured by Rutherford backscattering combined with ion channeling. The diffusivities for nonaligned (interstitial) and aligned (substitutional) dopants atoms were determined to vary with annealing temperature via the Arrhenius relationship. The diffusion activation energies (Ea) along the <10-11> direction for substitutional impurity atoms were lower than those for interstitial dopants atoms e.g., in the case of In, Ea ~ 1.52 eV for <10-11> aligned In atoms and Ea ~ 2.61 eV for interstitial In atoms between <10-11> atomic rows and in the case of Ag, Ea ~ 1.77 eV for the interstitial Ag atoms between the <10-11> atomic rows and 1.11 eV for <10-11> aligned Ag atoms. The diffusion activation energies showed a different trend for the two dopants as measured along the <0001> crystalline direction. For Ag implanted in ZnO, the activation energy of Ea ~ 0.91 eV for the aligned Ag atoms along <0001> direction and Ea ~ 1.55 eV were found for the interstitial Ag atoms, whereas in the case of In along the <0001> direction, the interstitial In was found to migrate with a higher activation energy (Ea ~ 1.78 eV) than the substitutional In (Ea ~1.42 eV). These results will be compared with first-principle calculations for understanding the energetics of defect formation and migration in both n- and p-type doping cases.


1989 ◽  
Vol 4 (1) ◽  
pp. 102-112 ◽  
Author(s):  
J. B. Adams ◽  
S. M. Foiles ◽  
W. G. Wolfer

The activation energies for self-diffusion of transition metals (Au, Ag, Cu, Ni, Pd, Pt) have been calculated with the Embedded Atom Method (EAM); the results agree well with available experimental data for both mono-vacancy and di-vacancy mechanisms. The EAM was also used to calculate activation energies for vacancy migration near dilute impurities. These energies determine the atomic jump frequencies of the classic “five-frequency formula,” which yields the diffusion rates of impurities by a mono-vacancy mechanism. These calculations were found to agree fairly well with experiment and with Neumann and Hirschwald's “Tm” model.


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