TEM and X-Ray Analysis of (AlyGa1-y)xIn1-xP Quantum Well Layers Under Compressive and Tensile Strains

2022 ◽  
pp. 331-334
Author(s):  
S A Hall ◽  
P C Mogensen ◽  
U Bangert ◽  
S W Bland
Keyword(s):  
X Ray ◽  
1993 ◽  
Vol 84 (3) ◽  
pp. 475-489
Author(s):  
G. Bauer ◽  
E. Koppensteiner ◽  
P. Hamberger ◽  
J. Nützel ◽  
G. Abstreiter ◽  
...  

2017 ◽  
Vol 62 (3) ◽  
pp. 355-363 ◽  
Author(s):  
A. E. Blagov ◽  
G. B. Galiev ◽  
R. M. Imamov ◽  
E. A. Klimov ◽  
O. A. Kondratev ◽  
...  
Keyword(s):  

1998 ◽  
Vol 533 ◽  
Author(s):  
Glenn G. Jernigan ◽  
Conrad L. Silvestre ◽  
Mohammad Fatemi ◽  
Mark E. Twigg ◽  
Phillip E. Thompson

AbstractThe use of Sb as a surfactant in suppressing Ge segregation during SiGe alloy growth was investigated as a function of Sb surface coverage, Ge alloy concentration, and alloy thickness using xray photoelectron spectroscopy, x-ray diffraction, and transmission electron microscopy. Unlike previous studies where Sb was found to completely quench Ge segregation into a Si capping layer, we find that Sb can not completely prevent Ge segregation while Si and Ge are being co-deposited. This results in the production of a non-square quantum well with missing Ge at the beginning and extra Ge at the end of the alloy. We also found that Sb does not relieve strain in thin films but does result in compositional or strain variations within thick alloy layers.


1996 ◽  
Vol 221 (1-4) ◽  
pp. 487-493 ◽  
Author(s):  
E. Zolotoyabko ◽  
Y. Finkelstein ◽  
M. Blumina ◽  
D. Fekete

1998 ◽  
Vol 186 (1-2) ◽  
pp. 48-54 ◽  
Author(s):  
M Tabuchi ◽  
K Fujibayashi ◽  
N Yamada ◽  
K Hagiwara ◽  
A Kobashi ◽  
...  

1987 ◽  
Vol 2 (4) ◽  
pp. 241-243 ◽  
Author(s):  
T W Ryan ◽  
P D Hatton ◽  
S Bates ◽  
M Watt ◽  
C Sotomayor-Torres

1998 ◽  
Vol 537 ◽  
Author(s):  
M.D. McCluskey ◽  
L.T. Romano ◽  
B.S. Krusor ◽  
D. Hofstetter ◽  
D.P. Bour ◽  
...  

AbstractInterdiffusion of In and Ga is observed in InGaN multiple-quantum-well superlattices for annealing temperatures of 1250 to 1400°C. Hydrostatic pressures of up to 15 kbar were applied during the annealing treatments to prevent decomposition of the InGaN and GaN. In as-grown material, x-ray diffraction spectra show InGaN superlattice peaks up to the fourth order. After annealing at 1400°C for 15 min, only the zero-order InGaN peak is observed, a result of compositional disordering of the superlattice. Composition profiles from secondary ion mass spectrometry indicate significant diffusion of Mg from the p-type GaN layer into the quantum well region. This Mg diffusion may lead to an enhancement of superlattice disordering. For annealing temperatures between 1250 and 1300°C, a blue shift of the InGaN spontaneous emission peak is observed, consistent with interdiffusion of In and Ga in the quantum-well region.


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