scholarly journals Characterization of Optical filters using Rutherford Backscattering Spectroscopy

2019 ◽  
Vol 10 ◽  
pp. 14
Author(s):  
R. Vlastou ◽  
E. Fokitis ◽  
G. Kalliabakos ◽  
M. Kokkoris ◽  
E. Kossionides
Keyword(s):  
Thin Film ◽  
Optical Filters ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Tandem Accelerator ◽  
Simulation Code ◽  
Uv Photons ◽  
The Individual ◽  
Background Photon ◽  
Layer Thin Film

The composition and thickness of optical filters, especially designed for the Auger project, were measured using the RBS method. The aim of this project is to detect the extensive air showers, developed by the interaction of very energetic cosmic rays with the atmospheric air. This swarm of particles, moving at the speed of light through the atmosphere, ionizes the nitrogen atoms, which radiate UV photons in the range of 300-420 nm. This nitrogen fluorescence is subsequently detected by fluorescence detectors having optical filters placed in front of their photomultipliers with high transmittance in the region of 300-420 nm and low transmittance outside this region, in order to maximize the photon signal to background photon ratio. The required transmittance of the optical filters led to specific production techniques, such as the dielectric multi-layer thin film deposition on a substrate, using high-low index UV-transparent materials. In order to select the optimal deposition technique for the mass production of these filters, the RBS method has been used, among others, to provide information concerning the thickness of the individual layers and possible deviations from the desired stoichiometry.The optical filters presented in this work were made of 6 and 12 thin film layers of WOzjMgFi deposited on UV glass. The samples were bombarded with α-particles at EQ — 3MeV, provided by the 5.5 MV Tandem Accelerator at NCSR "Demokritos". The RBS spectra were analyzed utilizing the computer simulation code RUMP.

Effects of Interfacial Organic Layers on Nucleation, Growth, and Morphological Evolution in Atomic Layer Thin Film Deposition

2007 ◽  
Vol 111 (29) ◽  
pp. 11045-11058 ◽  
Author(s):  
Abhishek Dube ◽  
Manish Sharma ◽  
Paul F. Ma ◽  
Peter A. Ercius ◽  
David A. Muller ◽  
...  
Keyword(s):  
Thin Film ◽  
Morphological Evolution ◽  
Atomic Layer ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Organic Layers ◽  
Layer Thin Film ◽  
Nucleation Growth

Multi-layer thin-film deposition for high-performance X-ray field-emission characteristics

2021 ◽  
pp. 2140043
Author(s):  
Tae Hwan Jang ◽  
Tae Gyu Kim ◽  
Mun Ki Bae ◽  
Kyuseok Kim ◽  
Jaegu Choi
Keyword(s):  
Thin Film ◽  
Field Emission ◽  
High Performance ◽  
Low Voltage ◽  
High Vacuum ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
X Ray ◽  
Emission Effect ◽  
Layer Thin Film

In this study, we developed a nanoscale emitter having a multi-layer thin-film nanostructure in an effort to maximize the field-emission effect with a low voltage difference. The emitter was a sapphire board on which tungsten–DLC multi-player thin film was deposited using PVD and CVD processes. This multi-layer thin-film emitter was examined in a high-vacuum X-ray tube system. Its field-emission efficiency according to the applied voltage was then analyzed.

Incorporation of a Pd catalyst at the fuel electrode of a thin-film-based solid oxide cell by multi-layer deposition and its impact on low-temperature co-electrolysis

2017 ◽  
Vol 5 (16) ◽  
pp. 7433-7444 ◽  
Author(s):  
Cam-Anh Thieu ◽  
Jongsup Hong ◽  
Hyoungchul Kim ◽  
Kyung Joong Yoon ◽  
Jong-Ho Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Solid Oxide ◽  
Pd Catalyst ◽  
Functional Layer ◽  
Layer Deposition ◽  
Layer Thin Film ◽  
Solid Oxide Cell

To reveal the reaction mechanism of low-temperature co-electrolysis (LT-Co-EC), insertion of Pd into the Ni–YSZ fuel electrode functional layer by multi-layer thin film deposition was studied.

Observations on the growth of YBa2Cu3O7-δ thin films on MgO by pulsed-laser ablation

1991 ◽  
Vol 49 ◽  
pp. 1068-1069
Author(s):  
M. Grant Norton ◽  
C. Barry Carter
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Ablation ◽  
Substrate Surface ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Laser Ablation Process ◽  
Deposition Parameters

Pulsed-laser ablation has been widely used to produce high-quality thin films of YBa2Cu3O7-δ on a range of substrate materials. The nonequilibrium nature of the process allows congruent deposition of oxides with complex stoichiometrics. In the high power density regime produced by the UV excimer lasers the ablated species includes a mixture of neutral atoms, molecules and ions. All these species play an important role in thin-film deposition. However, changes in the deposition parameters have been shown to affect the microstructure of thin YBa2Cu3O7-δ films. The formation of metastable configurations is possible because at the low substrate temperatures used, only shortrange rearrangement on the substrate surface can occur. The parameters associated directly with the laser ablation process, those determining the nature of the process, e g. thermal or nonthermal volatilization, have been classified as ‘primary parameters'. Other parameters may also affect the microstructure of the thin film. In this paper, the effects of these ‘secondary parameters' on the microstructure of YBa2Cu3O7-δ films will be discussed. Examples of 'secondary parameters' include the substrate temperature and the oxygen partial pressure during deposition.

Characterization of Y-Ba-Cu-O films grown on silicon substrates by sequential evaporation

1988 ◽  
Vol 46 ◽  
pp. 866-867
Author(s):  
E. L. Hall ◽  
A. Mogro-Campero ◽  
L. G. Turner ◽  
N. Lewis
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Superconducting Films ◽  
Electron Beam Evaporation ◽  
Film Deposition ◽  
Silicon Substrates ◽  
Superconducting Properties ◽  
Sequential Electron ◽  
Thin Superconducting Films

There is great interest in the growth of thin superconducting films of YBa2Cu3Ox on silicon, since this is a necessary first step in the use of this superconductor in a variety of possible electronic applications including interconnects and hybrid semiconductor/superconductor devices. However, initial experiments in this area showed that drastic interdiffusion of Si into the superconductor occurred during annealing if the Y-Ba-Cu-O was deposited direcdy on Si or SiO2, and this interdiffusion destroyed the superconducting properties. This paper describes the results of the use of a zirconia buffer layer as a diffusion barrier in the growth of thin YBa2Cu3Ox films on Si. A more complete description of the growth and characterization of these films will be published elsewhere.Thin film deposition was carried out by sequential electron beam evaporation in vacuum onto clean or oxidized single crystal Si wafers. The first layer evaporated was 0.4 μm of zirconia.

CVD copper thin film deposition using (α-methylstyrene)Cu(I)(hfac)

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-553-Pr3-560 ◽  
Author(s):  
W. Zhuang ◽  
L. J. Charneski ◽  
D. R. Evans ◽  
S. T. Hsu ◽  
Z. Tang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Copper Thin Film

Organic Electronics

2020 ◽  
Author(s):  
Stephen R. Forrest
Keyword(s):  
Thin Film ◽  
Organic Electronics ◽  
Thin Film Transistors ◽  
High Performance ◽  
Electronic Devices ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Organic Thin Film ◽  
Graduate Studies ◽  
Organic Light

Organic electronics is a platform for very low cost and high performance optoelectronic and electronic devices that cover large areas, are lightweight, and can be both flexible and conformable to irregularly shaped surfaces such as foldable smart phones. Organics are at the core of the global organic light emitting device (OLED) display industry, and also having use in efficient lighting sources, solar cells, and thin film transistors useful in medical and a range of other sensing, memory and logic applications. This book introduces the theoretical foundations and practical realization of devices in organic electronics. It is a product of both one and two semester courses that have been taught over a period of more than two decades. The target audiences are students at all levels of graduate studies, highly motivated senior undergraduates, and practicing engineers and scientists. The book is divided into two sections. Part I, Foundations, lays down the fundamental principles of the field of organic electronics. It is assumed that the reader has an elementary knowledge of quantum mechanics, and electricity and magnetism. Background knowledge of organic chemistry is not required. Part II, Applications, focuses on organic electronic devices. It begins with a discussion of organic thin film deposition and patterning, followed by chapters on organic light emitters, detectors, and thin film transistors. The last chapter describes several devices and phenomena that are not covered in the previous chapters, since they lie outside of the current mainstream of the field, but are nevertheless important.

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