Stroboscopic Two-Wavelength Interferometer for Disturbance-Free Step-Height Measurement

2005 ◽  
Author(s):  
Takamasa Suzuki ◽  
Masanori Ohida ◽  
Kazuhiro Yokoyama ◽  
Osami Sasaki
2016 ◽  
Vol 24 (19) ◽  
pp. 21880 ◽  
Author(s):  
Lianlian Dong ◽  
Fang Xie ◽  
Sen Ma ◽  
Yunzhi Wang ◽  
Liang Chen

2003 ◽  
Vol 42 (28) ◽  
pp. 5670 ◽  
Author(s):  
Jennifer E. Decker ◽  
John R. Miles ◽  
Alan A. Madej ◽  
Ralph F. Siemsen ◽  
Klaus J. Siemsen ◽  
...  

ACTA IMEKO ◽  
2013 ◽  
Vol 2 (1) ◽  
pp. 12 ◽  
Author(s):  
Sitian Gao ◽  
Mingzhen Lu ◽  
Wei Li ◽  
Yushu Shi ◽  
Qi Li

<span style="font-family: &quot;Times New Roman&quot;; font-size: 10pt; mso-fareast-font-family: 宋体; mso-ansi-language: EN-GB; mso-fareast-language: ZH-CN; mso-bidi-language: AR-SA; mso-bidi-font-size: 12.0pt;" lang="EN-GB">The quantity assurance in semiconductor industry development requires dimensional measurement with nanometer accuracy. A metrological AFM is designed to establish a traceable standard with nanometer uncertainty. The principle and design of the instrument is introduced in this paper. The displacement of the sample is traced to the SI unit by interferometers. The metrological AFM is applied to step height and line width measurement. The results are compared with optical instrument and profilometer. The metrological AFM is used to step height measurement in an international comparison and the result shows an uncertainty less than </span><span style="font-family: &quot;Times New Roman&quot;; font-size: 10pt; mso-fareast-font-family: 宋体; mso-ansi-language: EN-CA; mso-fareast-language: ZH-CN; mso-bidi-language: AR-SA; mso-bidi-font-size: 12.0pt;" lang="EN-CA">2 nm. The application of metrological AFM in line width and pitch are also introduced.</span>


2022 ◽  
Author(s):  
Brett F. Bathel ◽  
Joshua M. Weisberger ◽  
Scott A. Berry ◽  
Stephen B. Jones

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