This paper develops one method to characterize nano dimension standards using Scanning White Light Interference Sensor (SWLIS) based on Nano Measurement Machine (NMM). The experimental results show the average value of SHS8-440 low step height standard is 44.15 nm and SHS8-100.0 high step height standard is 100.29 μm, with a standard deviation of 0.30 nm and 0.03 μm, respectively. Also, SWLIS is performed to measure and characterize step height standards, which cover most of the conventional step height standards produced by VLSI Standards Incorporated (VLSI). Additionally, atomic force microscope (AFM) is used as a beneficial supplement due to low lateral resolution of optical methods. The average value of TGZ1_PTB 1D grating from NT-MDT Company is 3000.2 nm with a standard deviation of 0.3 nm by AFM.
White-light interference microscopy: a way to obtain high lateral resolution over an extended range of heights
