Disorder-Induced Low-Frequency Raman Band Observed in Deposited MoS2 Films

1994 ◽  
Vol 48 (6) ◽  
pp. 733-736 ◽  
Author(s):  
N. T. McDevitt ◽  
J. S. Zabinski ◽  
M. S. Donley ◽  
J. E. Bultman

Crystalline disorder in thin films plays an important role in determining their properties. Disorder in the crystal structure of MoS2 films prepared by magnetron sputtering and pulsed laser deposition was evaluated with the use of Raman spectroscopy. The peak positions and bandwidths of the first-order Raman bands, in the region 100 to 500 cm−1, were used as a measure of crystalline order. In addition, a low-frequency feature was observed at 223 cm−1 that is not part of the normal first-order spectrum of a fully crystalline specimen. Data presented here demonstrate that this band is characteristic of crystalline disorder, and its intensity depends on the annealing history of the film. This behavior seems to be analogous to the disorder found in graphite thin films.

1998 ◽  
Vol 136 (3) ◽  
pp. 173-177 ◽  
Author(s):  
Chunling Li ◽  
Dafu Cui ◽  
Yueliang Zhou ◽  
Huibin Lu ◽  
Zhenghao Chen ◽  
...  

2009 ◽  
Vol 1174 ◽  
Author(s):  
Boqian Yang ◽  
Xianping Feng

AbstractFlowerlike ZnO nanoneedle arrays have been synthesized on Si (100) substrates by pulsed laser deposition techniques. The tips of the nanoneedles are ˜ 20- 50 nm in diameter and their roots are as thick as ˜ 50- 100 nm. The nanoneedle arrays grow preferentially along the [0001] direction. Raman spectroscopy shows three first order optical normal modes which confirm wurtzite structure of ZnO nanoneedles. In the low frequency zone, additive modes (92, 122, 163, and 275 cm-1) are observed and can be attributed to zone boundary phonons. ZnO nanoneedle arrays exhibit a strong UV luminescence emission, and two strong peaks at 3.258 eV and 3.288 eV are observed.


2007 ◽  
Vol 1034 ◽  
Author(s):  
Seiji Nakashima ◽  
Dan Ricinschi ◽  
Yoshitaka Nakamura ◽  
Masanori Okuyama ◽  
Hironori Fujisawa ◽  
...  

AbstractAn Influence of stress of crystal structure of polycrystalline BiFeO3 (BFO) thin film on membrane structure has been investigated. To confirm the stress dependence of the crystal structure, reciprocal space mapping measurement of polycrystalline BFO thin films on Pt (200 nm)/TiO2 (50 nm)/SiO2 (600 nm)/Si (625 μm) plate substrate and Pt (200 nm)/TiO2 (50 nm)/SiO2 (600 nm)/Si (15 μm) membrane substrate have been performed. These BFO thin films have been prepared by pulsed laser deposition (PLD). The obtained BFO thin films were polycrystalline and mainly oriented to (001) and (110) plane. From reciprocal space mapping measurement, (110) oriented BFO grains on Pt/TiO2/SiO2/Si (15 μm) membrane substrate were expanded perpendicularly to the film plane about 0.15% and compressed in parallel to the film plane about 0.7% comparing to that on Pt/TiO2/SiO2/Si (625 μm) plate substrate. And (001) oriented BFO grains on the Pt/TiO2/SiO2/Si membrane substrate were expanded about 0.20% perpendicularly to the film plane and compressed about 1.3% in parallel to the film plane comparing to that on Pt/TiO2/SiO2/Si (625 μm) plate substrat


1995 ◽  
Vol 34 (Part 1, No. 1) ◽  
pp. 254-260 ◽  
Author(s):  
Masahiko Hiratani ◽  
Kazushige Imagawa ◽  
Kazumasa Takagi

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