scholarly journals Influence of Laser Incident Energy on Chemical Composition, Crystal Structure, Morphology and Band Gap of Cu2ZnSnS4 Thin Films by Pulsed Laser Deposition

Author(s):  
Yanan Wen ◽  
Lin Li ◽  
Yan Dong ◽  
Min Yao ◽  
Qi Liang
2013 ◽  
Vol 547 ◽  
pp. 59-62 ◽  
Author(s):  
Jie Jiang ◽  
Liping Zhu ◽  
Yang Li ◽  
Yanmin Guo ◽  
Weishun Zhou ◽  
...  

Coatings ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 136
Author(s):  
Ping Tang ◽  
Weimin Wang ◽  
Bing Li ◽  
Lianghuan Feng ◽  
Guanggen Zeng

Aluminum antimony (AlSb) is a promising photovoltaic material with a band gap of about 1.62 eV. However, AlSb is highly deliquescent and not stable, which has brought great difficulties to the applications. Based on the above situation, there are two purposes for preparing our Zn-doped AlSb (AlSb:Zn) thin films: One is to make P-type AlSb and the other is to find a way to suppress the deliquescence of AlSb. The AlSb:Zn thin films were prepared on glass substrates at different substrate temperatures by using the pulsed laser deposition (PLD) method. The structural, surface morphological, optical, and electrical properties of AlSb:Zn films were investigated. The crystallization of AlSb:Zn thin films was enhanced and the electrical resistivity decreased as the substrate temperature increased. The scanning electron microscopy (SEM) images indicated that the grain sizes became bigger as the substrate temperatures increased. The Raman vibration mode AlSb:Zn films were located at ~107 and ~142 cm−1 and the intensity of Raman peaks was stronger at higher substrate temperatures. In the experiment, a reduced band gap (1.4 eV) of the AlSb:Zn thin film was observed compared to the undoped AlSb films, which were more suitable for thin-film solar cells. Zn doping could reduce the deliquescent speed of AlSb thin films. The fabricated heterojunction device showed the good rectification behavior, which indicated the PN junction formation. The obvious photovoltaic effect has been observed in an FTO/ZnS/AlSb:Zn/Au device.


2010 ◽  
Vol 55 (10) ◽  
pp. 1509-1516 ◽  
Author(s):  
V. Yu. Fominski ◽  
R. I. Romanov ◽  
A. G. Gnedovets ◽  
V. N. Nevolin

2010 ◽  
Vol 404 (1) ◽  
pp. 186-191 ◽  
Author(s):  
J.-K. Chung ◽  
J. W. Kim ◽  
D. Do ◽  
S. S. Kim ◽  
T. K. Song ◽  
...  

1997 ◽  
Vol 472 ◽  
Author(s):  
M.A. El Khakani ◽  
M. Chaker

ABSTRACTReactive pulsed laser deposition has been used to deposit IrO2 thin films on both SiO2 and fused quartz substrates, by ablating a metal iridium target in oxygen atmosphere. At a KrF laser intensity of about 1.7 × 109 W/cm2, IrO2 films were deposited at substrate deposition temperatures ranging from room-temperature to 700 °C under an optimum oxygen ambient pressure of 200 mTorr. The structure, morphology, electrical resistivity and optical transmission of the deposited films were characterized as a function of their deposition temperature (Td). High quality IrO2 films are obtained in the 400–600 °C deposition temperature range. They are polycrystalline with preferred orientations, depending on the substrate, and show a dense granular morphology. At a Td as low as 400 °C, highly conductive IrO2 films with room-temperature resistivities as low as (42±6) μΩ cm are obtained. Over the 300–600 °C Td range, the IrO2 films were found to exhibit a maximum optical transmission at 450 °C (∼ 45 % at 500 nm for 80 nm-thick films).


2002 ◽  
Vol 42 (1) ◽  
pp. 219-233 ◽  
Author(s):  
Félix E. Fernández ◽  
Yelitza González ◽  
Huimin Liu ◽  
Antonio Martínez ◽  
Vićtor Rodríguez ◽  
...  

1995 ◽  
Vol 86 (1-4) ◽  
pp. 165-169 ◽  
Author(s):  
T. Klotzbücher ◽  
W. Pfleging ◽  
M. Mertin ◽  
D.A. Wesner ◽  
E.W. Kreutz

2009 ◽  
Vol 255 (10) ◽  
pp. 5260-5263 ◽  
Author(s):  
D. Craciun ◽  
G. Socol ◽  
N. Stefan ◽  
G. Bourne ◽  
V. Craciun

1995 ◽  
Vol 4 (4) ◽  
pp. 370-374 ◽  
Author(s):  
W. Pfleging ◽  
T. Klotzbücher ◽  
D.A. Wesner ◽  
E.W. Kreutz

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