scholarly journals Development of a Bi2Te3-based thermoelectric generator with high-aspect ratio, free-standing legs

2012 ◽  
Vol 27 (8) ◽  
pp. 1149-1156 ◽  
Author(s):  
D.E. Wesolowski ◽  
R.S. Goeke ◽  
A.M. Morales ◽  
S.H. Goods ◽  
P.A. Sharma ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Thermoelectric Generator ◽  
Free Standing ◽  
Image Position

Abstract

Development of free standing anodes of high aspect ratio carbon materials for rechargeable Li-ion batteries

2013 ◽  
Vol 92 ◽  
pp. 55-63 ◽  
Author(s):  
Priyanka H. Maheshwari ◽  
C. Nithya ◽  
Shilpa Jain ◽  
R.B. Mathur
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Carbon Materials ◽  
Li Ion Batteries ◽  
Free Standing ◽  
Li Ion

Gold nanowires with high aspect ratio and morphological purity: Synthesis, characterization, and evaluation of parameters

2013 ◽  
Vol 28 (2) ◽  
pp. 250-260 ◽  
Author(s):  
Elcin Dertli ◽  
Sahin Coskun ◽  
Emren Nalbant Esenturk
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Gold Nanowires ◽  
Evaluation Of Parameters ◽  
Image Position

Abstract

Fabrication of High Aspect Ratio Millimeter-Tall Free-Standing Carbon Nanotube-Based Microelectrode Arrays

2018 ◽  
Author(s):  
Guohai Chen ◽  
Berg Dodson ◽  
David M. Hedges ◽  
Scott C. Steffensen ◽  
John N. Harb ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Microelectrode Arrays ◽  
Free Standing

Ultrasound-assisted recovery of free-standing high-aspect-ratio micropillars

RSC Advances ◽  
2016 ◽  
Vol 6 (20) ◽  
pp. 16640-16644 ◽  
Author(s):  
Hongzhong Liu ◽  
Biao Lei ◽  
Weitao Jiang ◽  
Yonghao Li ◽  
Lei Yin ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Free Standing ◽  
Ultrasound Assisted ◽  
Micropillar Arrays

High-aspect-ratio polymer micropillar arrays are widely employed in microfluidics and microdevices.

A New Way to Form Three-Dimensional Microstructures by Electrochemical Etching of Silicon

2000 ◽  
Vol 638 ◽  
Author(s):  
P. Kleimann ◽  
J. Linnros ◽  
R. Juhasz
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Electrochemical Etching ◽  
Three Dimensional ◽  
Periodic Pattern ◽  
Free Standing ◽  
Vertical Walls ◽  
A New Technique ◽  
Etching Parameters ◽  
Current Lines

AbstractA new technique of bulk micromachining using anodic etching of (100)-oriented n-type silicon is presented. For particular conditions the transition regime between porous silicon formation and electropolishing enables the formation of high aspect ratio microtips which correspond to inverted macropore structures. This unusual property can be explained by the distortion of current lines near the basis of formed structures. The distortion, which prevents the tip dissolution, is due to the electrical field in the space charge region at the silicon-electrolyte interface. The same property can be used to form three-dimensional microstructures. The position and shape of the structures can be defined by forming steps of a few microns depth, prior tothe electrochemical etching. Then the etching parameters (HF concentration, light intensity, etching current density) are adjusted in order to electropolish the sample except where vertical walls are needed. This enables to form microstructures without a periodic pattern. The feasibility of this technique is demonstrated by forming 100μm wide pores, free-standing beams as well as high aspect ratio micro-needles and micro-tubes.

Fabrication of free-standing subwavelength metal–insulator–metal gratings using high-aspect-ratio nanoimprint techniques

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GP20 ◽  
Author(s):  
Hiroaki Honma ◽  
Masato Mitsudome ◽  
Shintaro Itoh ◽  
Makoto Ishida ◽  
Kazuaki Sawada ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Free Standing ◽  
Metal Insulator ◽  
Metal Insulator Metal ◽  
Metal Gratings
Sign in / Sign up

Export Citation Format

Share Document