scholarly journals Atomic layer deposition of zirconium oxide thin films

2019 ◽  
Vol 35 (7) ◽  
pp. 804-812
Author(s):  
Xin Wang ◽  
Sujan Kumar Ghosh ◽  
Mahyar Afshar-Mohajer ◽  
Hua Zhou ◽  
Yongqiang Liu ◽  
...  

Abstract

2010 ◽  
Vol 157 (10) ◽  
pp. G193 ◽  
Author(s):  
Aile Tamm ◽  
Marianna Kemell ◽  
Jekaterina Kozlova ◽  
Timo Sajavaara ◽  
Massimo Tallarida ◽  
...  

2015 ◽  
Vol 21 (7-8-9) ◽  
pp. 181-187 ◽  
Author(s):  
Aile Tamm ◽  
Jekaterina Kozlova ◽  
Tõnis Arroval ◽  
Lauri Aarik ◽  
Peeter Ritslaid ◽  
...  

Nanoscale ◽  
2021 ◽  
Author(s):  
Hyo-Bae Kim ◽  
Moonyoung Jung ◽  
Youkyoung Oh ◽  
Seung Won Lee ◽  
Dongseok Suh ◽  
...  

HfO2-based ferroelectric thin films deposited via atomic layer deposition have been extensively studied as promising candidates for next-generation ferroelectric devices. The conversion of an amorphous Hf1-xZrxO2 film to the ferroelectric...


CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.


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