Multispectral Spectroscopic Ellipsometry-A New Tool for In Situ Surface Analysis

1987 ◽  
Vol 101 ◽  
Author(s):  
F. Ferrjeu ◽  
J.L. Stehle ◽  
F. Bernoux ◽  
O. Thomas
Keyword(s):  
Thin Film ◽  
Epitaxial Growth ◽  
Surface Analysis ◽  
Spectroscopic Ellipsometry ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
New Instrument ◽  
Channel Analysis ◽  
Non Destructive

ABSTRACTSpectroscopie ellipsometry is a non-destructive tool for physical characterization without prior preparation of materials.Real time, in-situ measurements can be applied to analyze surface problems, to optimize thin film processing and even to monitor epitaxial growth or thin film deposition. Spectroscopie Eilipsometers built by SOPRA are described. A new instrument using Optical Multi-channel Analysis,(OMA), with a spectral range from 1.1 ev up to 4.8 ev which gives up to 11 ellipsometry spectra per second has been developed. Applications using Spectroscopie Ellipsometry are also discussed .

scholarly journals Measurements Of Stress Evolution During Thin Film Deposition

1996 ◽  
Vol 428 ◽  
Author(s):  
E. Chason ◽  
J. A. Floro
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Film Stress ◽  
Radius Of Curvature ◽  
Stress Evolution ◽  
Rectangular Array ◽  
Thin Film Stress ◽  
Ccd Detector

AbstractWe have developed a technique for measuring thin film stress during growth by monitoring the wafer curvature. By measuring the deflection of multiple parallel laser beams with a CCD detector, the sensitivity to vibration is reduced and a radius of curvature limit of 4 km has been obtained in situ. This technique also enables us to obtain a 2-dimensional profile of the surface curvature from the simultaneous reflection of a rectangular array of beams. Results from the growth of SiGe alloy films are presented to demonstrate the unique information that can be obtained during growth.

In situ ellipsometric diagnostics of multilayer thin film deposition during sputtering

1998 ◽  
Vol 313-314 ◽  
pp. 511-515 ◽  
Author(s):  
Xiang Gao ◽  
Darin W Glenn ◽  
John A Woollam
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Multilayer Thin Film

Nanoscale Holes Formed by In Situ Thin Film Deposition in a FIB

2004 ◽  
Vol 10 (S02) ◽  
pp. 1118-1119 ◽  
Author(s):  
Andrew M Minor ◽  
Francis Allen ◽  
Velimir R Radmilovic ◽  
Eric A Stach ◽  
Thomas Schenkel
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

scholarly journals Application of image spectrometer to in situ infrared broadband optical monitoring for thin film deposition

2011 ◽  
Vol 19 (14) ◽  
pp. 12969 ◽  
Author(s):  
Qing-Yuan Cai ◽  
Yu-Xiang Zheng ◽  
Dong-Xu Zhang ◽  
Wei-Jie Lu ◽  
Rong-Jun Zhang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optical Monitoring ◽  
Image Spectrometer

In and out-diffusion of oxygen during YBa2Cu3O7−δ thin film deposition by in situ resistance measurement

1992 ◽  
Author(s):  
J. P. Zheng ◽  
D. H. Kim ◽  
S. Y. Dong ◽  
C. Lehane ◽  
W. P. Shen ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Resistance Measurement
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