Rapid chemical vapor sensing and micro gas chromatography detection using optofluidic ring resonators

2008 ◽  
Vol 1133 ◽  
Author(s):  
Yuze Sun ◽  
Siyka I. Shopova ◽  
Ian M. White ◽  
Hongying Zhu ◽  
Greg Frye-Mason ◽  
...  

Abstract We develop rapid chemical vapor sensors and micro gas chromatography (μGC) analyzers based on the optofluidic ring resonator (OFRR). An OFRR is a micro-sized thin-walled glass capillary; the circular cross-section of the capillary acts as an optical ring resonator while the whispering gallery modes or circulating waveguide modes (WGMs) supported by the ring resonator interact with the vapor samples passing through the capillary. The OFRR interior surface is coated with a vapor-sensitive polymer. The analyte and polymer interaction causes the polymer refractive index (RI) and the thickness to change, which is detected as a WGM spectral shift. Owing to the excellent fluidics, the OFRR vapor sensor exhibits sub-second detection and recovery time with a flow rate of 1 mL/min. On-column separation and detection in the OFRR based μGC system is also demonstrated, showing efficient separation of vapor mixtures and presenting highly reproducible retention time for the individual analyte. Compared to the conventional GC system, the OFRR μGC has the advantage of small size, rapid response, and high selectivity over a short length of column.

2021 ◽  
Author(s):  
Harry Ramza ◽  
Emas Fiqry Nurdwiprasetio ◽  
Aditya Ervansyah ◽  
Sugianto ◽  
Saeed Salem Bahashwan ◽  
...  

2009 ◽  
Author(s):  
Yuze Sun ◽  
Jing Liu ◽  
Greg Frye-Mason ◽  
Aaron Thompson ◽  
Shiou-Jyh Ja ◽  
...  

2008 ◽  
Vol 33 (8) ◽  
pp. 788 ◽  
Author(s):  
Yuze Sun ◽  
Siyka I. Shopova ◽  
Greg Frye-Mason ◽  
Xudong Fan

2012 ◽  
Vol 51 ◽  
pp. 045101 ◽  
Author(s):  
Hyung Goo Park ◽  
Sukju Hwang ◽  
Juhwan Lim ◽  
Duck-Hwan Kim ◽  
In Sang Song ◽  
...  

1983 ◽  
Vol 279 ◽  
pp. 349-355 ◽  
Author(s):  
J.C.M. Wessels ◽  
R.P.M. Dooper

2013 ◽  
Vol 205-206 ◽  
pp. 284-289 ◽  
Author(s):  
David Lysáček ◽  
Petr Kostelník ◽  
Petr Pánek

We report on a novel method of low pressure chemical vapor deposition of polycrystalline silicon layers used for external gettering in silicon substrate for semiconductor applications. The proposed method allowed us to produce layers of polycrystalline silicon with pre-determined residual stress. The method is based on the deposition of a multilayer system formed by two layers. The first layer is intentionally designed to have tensile stress while the second layer has compressive stress. Opposite sign of the residual stresses of the individual layers enables to pre-determine the residual stress of the gettering stack. We used scanning electron microscopy for structural characterization of the layers and intentional contamination for demonstration of the gettering properties. Residual stress of the layers was calculated from the wafer curvature.


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