Mechanics of the Peel Test for Thin Film Adhesion

1988 ◽  
Vol 119 ◽  
Author(s):  
K-S. Kim

AbstractThe mechanics aspects of the peel test are analyzed. In this analysis, the limitation and applicability of the peel test for thin film adhesion have been investigated. Firstly, the effect of plasticity in the peel test of thin metallic films is analyzed. The analysis has given a closed form solution for the partitioning of peel strength between the energy expenditure rate for the decohesion process and the internal work expenditure rate caused by plastic deformation (bending) of the film. The results predicted the variation of peel strength as a function of the film thickness, the film yield stress and the compliance of the substrate. This analysis shows that the peel strength is very sensitive to the thickness of the film and the yield stress of the film. As observed in the experiment, the peel strength has a peak value at a certain thickness of the film. This is explained for both L and T peel tests. Unlike the L peel test, the peak phenomenon in the T peel test (of metallic films) is due to the hardening of the adhered film. Secondly, the effect of plasticity and viscoelasticity in the peel test of thin polymer films is analyzed. Unlike the peel test of metallic films, tension and shear effect of the film deformation is very important in the analysis of the polymer peel test. An integral equation is formulated for the viscoelastic models of the adhered film. The solution of the integral equation reveals the important parameters in polymer peeling and their contribution to the peel force as well as to the viscoelastic dissipation. In addition, the meaning of the interface toughness is reexamined and the interface toughness is evaluated by the peel test. Based on these analyses, a Universal Peel Diagram has been constructed, which accounts for the hardening behavior of the film. On this diagram, objective interfacial decohesion toughness can be readily obtained using very simple peel tests. The analysis includes not only the 900° peel test but also the general angle peel test. Comparison between the theory and experiment has been made with the experimental data provided by J. Kim of IBM. The comparison shows good agreement.

1988 ◽  
Vol 110 (3) ◽  
pp. 266-273 ◽  
Author(s):  
Kyung-Suk Kim ◽  
Junglhl Kim

Analyses have been made to extract the objective interfacial fracture toughness from the peel strength of very thin metallic films. An elastoplastic bending model of the adherend film has been employed in the analyses applying the fracture mechanics concept of steady-state interfacial crack growth. The analytic result finally shown is a universal peel diagram where the objective interfacial fracture toughness is readily readable when the peel strength is known. Experimental results for Cu films on Si and polyimide substrate systems with a Cr interface are also presented.


1991 ◽  
Vol 239 ◽  
Author(s):  
H. S. Jeong ◽  
Y. Z. Chu ◽  
M. B. Freiler ◽  
C. Durning ◽  
R. C. White

ABSTRACTFracture energy (Ga) of BPDA-PDA polyimide (PI) on modified and unmodified Si surfaces was measured by the “blister” test as a function of final cure temperature. It is proven quantitatively that surface modification prior to thin film deposition enhances adhesion. Metal adhesion to PI was also measured by the same method. Reproducibility of the data was found to be exceptionally good for both cases. The linear elastic model is quite valid for the test of thin film adhesion. Therefore, it is believed that this test is best suited for Ga measurements in the study of thin film adhesion for microelectronic packaging.


Nano Letters ◽  
2021 ◽  
Author(s):  
Jingcheng Ma ◽  
Jin Myung Kim ◽  
Muhammad Jahidul Hoque ◽  
Kamila J. Thompson ◽  
SungWoo Nam ◽  
...  

2016 ◽  
Vol 13 (3) ◽  
pp. 95-101 ◽  
Author(s):  
Carol Putman ◽  
Rachel Cramm Horn ◽  
J. Ambrose Wolf ◽  
Daniel Krueger

Low temperature cofired ceramic (LTCC) has been established as an excellent packaging technology for high-reliability, high-density microelectronics. The functionality and robustness of rework have been increased through the incorporation of a physical vapor deposition (PVD) thin film Ti/Cu/Pt/Au metallization. PVD metallization is suitable for radio frequency (RF) applications as well as digital systems. Adhesion of the Ti “adhesion layer” to the LTCC as-fired surface is not well understood. Although previous work has established extrinsic parameters for delamination mechanisms of thin films on LTCC substrates, there is incomplete information regarding the intrinsic (i.e., thermodynamic) parameters in the literature. This article analyzes the thermodynamic favorability of adhesion between Ti, Cr, and their oxide coatings on LTCC (assumed as amorphous silica glass and Al2O3). Computational molecular calculations are used to determine interface energy as an indication of molecular stability between pair of materials at specific temperature. The end result will expand the understanding of thin film adhesion to LTCC surfaces and assist in increasing the long-term reliability of the interface bonding on RF microelectronic layers.


Sign in / Sign up

Export Citation Format

Share Document