Gas Phase Reactions Relevant to Chemical Vapor Deposition: Optical Diagnostics
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AbstractLaser photolysis, optical emission, and laser-induced fluorescence (LIF) were used to investigate laser driven decomposition processes in the gas phase pertaining to the systems: SiH4 → Si (s) and SiH4 → NH3 → Si3N4 (s). These processes are important to silicon/ silicon-nitride chemical vapor deposition, flame-driven gas phase silicon-particle nucleation, and laser-induced processes for materials fabrication. UV laser photolysis was used to generate SiHx and NHx species from silane and ammonia. A number of photofragments were identified by emission from excited states. The rate of reaction of NH2 with silane was measured using LIF to detect NH2 as a function of time following photolysis of ammonia
2007 ◽
Vol 81
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pp. 515-523
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2016 ◽
Vol 51
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pp. 3897-3906
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1995 ◽
Vol 142
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pp. 2357-2362
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1993 ◽
Vol 163
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pp. 135-140
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1996 ◽
Vol 14
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pp. 772
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