Photoluminescence and Photoacoüstic Spectroscopy of Si Single-and Multi-Step Ingot- and Wafer-Annealed GaAs Crystals

1992 ◽  
Vol 262 ◽  
Author(s):  
O. Ka ◽  
O. Oda ◽  
S. Shigetomi ◽  
T. Ikari ◽  
Y. Makita ◽  
...  

ABSTRACTSI GaAs crystals submitted to single- or multi-step, ingot-or wafer-annealing are investigated using photoluminescence (PL) and photoacoustic spectroscopy (PA). The near-band-edge PL transitions are well resolved, with a neutral acceptor-bound exciton recombination displayed as a split doublet. The improvement induced by wafer-annealing is illustrated by the absence of additional defect-related transitions found after ingot-annealing. For the room temperature PA measurements, the intensity of a peak occuring at 1.39 eV is shown to lead to an estimation of the arsenic micro-defect density as evaluated by AB etching. The 1.39 eV PA band is also asserted to be the non-radiative recombination path of a 1.482 eV band found in the low-temperature PL spectra.

2007 ◽  
Vol 131-133 ◽  
pp. 601-606
Author(s):  
N.A. Sobolev

Single crystal Si, Si0.948Ge0.052 and Si0.66Ge0.34 diode as well as Ge transistor structures with high electroluminescence (EL) intensities in the region of interband transitions at room temperature were fabricated by different techniques and their luminescence properties were studies. The analysis of the experimental data shows that recombination involving excitons is the dominant mechanism of near-band edge radiative recombination in all the light-emitting structures at room temperature. Some of the structures are characterized by record values of EL intensity and/or external quantum efficiency, so they can be used as effective light emitters for Si optoelectronics.


2014 ◽  
Vol 116 (12) ◽  
pp. 123506 ◽  
Author(s):  
Z. N. Urgessa ◽  
J. R. Botha ◽  
M. O. Eriksson ◽  
C. M. Mbulanga ◽  
S. R. Dobson ◽  
...  

2010 ◽  
Vol 107 (4) ◽  
pp. 043902 ◽  
Author(s):  
Javed Iqbal ◽  
Xiaofang Liu ◽  
Naeem Ahmad ◽  
Takashi Harumoto ◽  
Dapeng Yu ◽  
...  

2019 ◽  
Vol 61 (10) ◽  
pp. 1746
Author(s):  
В.В. Романов ◽  
Э.В. Иванов ◽  
К.Д. Моисеев

AbstractAsymmetric n -InAs/InAs_(1 – _ y )Sb_ y / p -InAsSbP heterostructures with a narrow-gap active layer and a composition range y = 0.09–0.16 were grown by vapor phase epitaxy from metalorganic compounds. Room-temperature electroluminescence was observed at a wavelength of up to λ = 5.1 μm at a spectral maximum. The study of low-temperature electroluminescence spectra provided the possibility to establish the existence of two radiative recombination channels caused by the nature of the InAsSb/InAsSbP heterointerface. The effect produced by the chemistry of the active layer on the composition of the grown barrier layer and the formation of the InAsSb/InAsSbP heterojunction with an increase in the antimony content in the InAsSb solid solution was demonstrated.


1996 ◽  
Vol 449 ◽  
Author(s):  
Xiao Tang ◽  
Fazla R. B. Hossain ◽  
Kobchat Wongchotigul ◽  
Michael G Spencer

ABSTRACTThe Cathodoluminescence (CL) measurements of undoped and carbon doped aluminum nitride (AlN) thin films near the band-edge region were performed at 300, 77 and 4.2 K, respectively. These films were grown on three different substrates: 6H-SiC, 4H-SiC and sapphire. A dominant peak was observed in undoped samples around 5.9 eV. This peak can be further resolved into three distinct peaks at 6.05, 5.85, and 5.69 eV for AlN on sapphire. The temperature dependence of the peak positions and line widths were investigated. These peaks are believed to be due to exciton recombination. Also, the absorption spectra of carbon doped AlN on sapphire were analyzed to study the Urbach tail parameters which play an important role in near band-edge transitions.


1990 ◽  
Vol 121 (1) ◽  
pp. K125-K127 ◽  
Author(s):  
T. Ikari ◽  
H. Yokoyama ◽  
K. Maeda ◽  
K. Futagami

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