Laser Fabrication of Micron-Size Structures on CdS
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ABSTRACTWet and dry laser-etching experiments have been performed on polished CdS crystals, using a CW Ar laser, with the goal of writing patterns with μm linewidth. A nitric acid solution was found to exhibit no appreciable dark etching and high photoetching rate; surface roughening due to scattered light was its limitation. A dry, low-temperature (< 200°C) laser-etching process was also studied, and used to produce satisfactory line patterns with 1- to 5-μm linewidths and a 3:1 depth ratio.
2015 ◽
Vol 53
(9)
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pp. 1371-1379
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1989 ◽
Vol 38
(10)
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pp. 523-528
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1980 ◽
Vol 42
(9)
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pp. 1347-1349
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2021 ◽
Vol 69
(1)
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pp. 74-79
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1957 ◽
Vol 60
(11)
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pp. 1444-1447
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