Effects of Nitrogen on Formation and Properties of Diamondlike Films Synthesized by Dual Ion Beam Deposition

1993 ◽  
Vol 316 ◽  
Author(s):  
Xiaoming He ◽  
Hongwei Song ◽  
Wenzhi Li ◽  
Fuzhai Cui ◽  
Hengde Li ◽  
...  
Keyword(s):  
Tungsten Carbide ◽  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Amorphous Structure ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Diamondlike Carbon ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

ABSTRACTDiamondlike carbon-nitrogen films on silicon (111) wafer and tungsten carbide plates have been prepared by using dual ion beam sputtering deposition and simultaneous bombardment by N+ with energies of 100-800 eV at room temperature. These films retain their diamondlike characteristics. However, as the nitrogen content increases from 10% at to 20% at., the Auger electron spectroscopy spectra of films change obviously in fine structure and the main Cls peak of carbon atoms in the X-ray photoelectron spectroscopy spectra shifts to 285.65 eV. The maximum hardness of these films on tungsten carbide plates is about 5260 kg/mm2. The films have an amorphous structure and smooth surface. The state of nitrogen in films and its influence on the structure and properties of films are discussed.

The Effects of Ion Energy on Carbon and Tungsten Films Fabricated by Direct Ion Beam Deposition and Ion Beam Sputtering Deposition

1991 ◽  
Vol 223 ◽  
Author(s):  
I. Kataoka ◽  
K. Ito ◽  
N. Hoshi ◽  
T. Yonemitsu ◽  
K. Etoh ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Ion Beam ◽  
Amorphous Structure ◽  
Film Structure ◽  
Ion Beam Sputtering ◽  
Ion Energy ◽  
Sputtering Deposition ◽  
Ion Beam Deposition ◽  
Beam Sputtering ◽  
Beam Deposition

ABSTRACTThe x-ray reflectivity and surface morphology of C/W multilayers fabricated by ion beam sputtering (IBS) method was evaluated. Also the surface roughness and amorphous structure of C and W films fabricated by direct ion beam deposition (DIBD) method were evaluated as a function of ion energy. The reflectivity was measured by the C-K line (4.47nm) and STM was used for surface roughness measurement and root-mean-square value of correlation function of the RHEED pattern was used for evaluation of amorphous structure. The reflectivity of C/W multilayer was about 69% of the theoretical one, and micro-columnar structures were observed from STM images. The film structure and surface roughness of DIBD film were changed with the depositing ion energy. The surface roughness of films becomes smaller as the depositing energy becomes higher in the energy range from 20 to 140eV.

Deposition of thin tungsten carbide films by dual ion beam sputtering deposition

Vacuum ◽  
2018 ◽  
Vol 157 ◽  
pp. 45-50 ◽  
Author(s):  
Fei Zhu ◽  
Zhi-lei Chen ◽  
Ke-zhao Liu ◽  
Wei Liang ◽  
Zhengjun Zhang
Keyword(s):  
Tungsten Carbide ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Formation of the crystalline β-C3N4 phase by dual ion beam sputtering deposition

2007 ◽  
Vol 61 (14-15) ◽  
pp. 2855-2858 ◽  
Author(s):  
J.P. Rivière ◽  
D. Texier ◽  
J. Delafond ◽  
M. Jaouen ◽  
E.L. Mathé ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Ultra-low stress high reflective film by dual-ion-beam sputtering deposition

2021 ◽  
Vol 61 (03) ◽  
Author(s):  
Jinlin Bai ◽  
Huasong Liu ◽  
Yugang Jiang ◽  
Lishuan Wang ◽  
Xiao Yang ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Dual ion-beam sputtering deposition of palladium-fluoropolymer nano-composites

2005 ◽  
Vol 80 (4) ◽  
pp. 791-795 ◽  
Author(s):  
I. Farella ◽  
A. Valentini ◽  
N. Cioffi ◽  
L. Torsi
Keyword(s):  
Ion Beam ◽  
Nano Composites ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

2007 ◽  
Vol 47 (13) ◽  
pp. C107 ◽  
Author(s):  
Laurent Gallais ◽  
Jérémie Capoulade ◽  
Jean-Yves Natoli ◽  
Mireille Commandré ◽  
Michel Cathelinaud ◽  
...  
Keyword(s):  
Low Voltage ◽  
Ion Beam ◽  
Laser Damage ◽  
Ion Beam Sputtering ◽  
Damage Resistance ◽  
Ion Plating ◽  
Electron Beam Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

Investigation on the DLC films prepared by dual-ion beam sputtering deposition

Vacuum ◽  
1991 ◽  
Vol 42 (16) ◽  
pp. 1058
Author(s):  
Wang Tianmin ◽  
Wang WeiJie ◽  
Liu Guiang ◽  
Huang Liangpu ◽  
Luo Chuntai ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering
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