Optical and mechanical properties of diamondlike carbon produced by dual ion beam sputtering technique

1999 ◽  
Author(s):  
Salvatore Scaglione ◽  
Francesca Sarto ◽  
Raffaele Pepe ◽  
Antonella Rizzo ◽  
Marco Alvisi
Keyword(s):  
Mechanical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Diamondlike Carbon ◽  
Beam Sputtering ◽  
Optical And Mechanical Properties ◽  
Dual Ion Beam Sputtering

Ion Beam Processing of Optical Materials

1988 ◽  
Vol 129 ◽  
Author(s):  
F. L. Williams ◽  
L. L. Boyer ◽  
W. Reicher ◽  
J. J. McNally ◽  
G. A. Al-Jumaily ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Packing Density ◽  
Optical Materials ◽  
Ion Beam ◽  
Film Material ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Optical And Mechanical Properties ◽  
Deposition Techniques

ABSTRACTWe have deposited thin films of optical materials using ion beam sputtering and ion assisted deposition techniques. It is possible to obtain good quality film material deposited on substrates at temperatures lower than normally required. Ion assisted deposition influences film stoichiometry and packing density, which in turn determine optical and mechanical properties of the film material. We discuss two general indicators which appear helpful in predicting the degree to which these occur.

Ion Beam Processing of Optical Materials

1988 ◽  
Vol 128 ◽  
Author(s):  
F. L. Williams ◽  
L. L. Boyer ◽  
D W. Reicher ◽  
J. J. McNally ◽  
G. A. Al-Jumaily ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Packing Density ◽  
Optical Materials ◽  
Ion Beam ◽  
Film Material ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Optical And Mechanical Properties ◽  
Deposition Techniques

ABSTRACTWe have deposited thin films of optical materials using ion beam sputtering and ion assisted deposition techniques. It is possible to obtain good quality film material deposited on substrates at temperatures lower than normally required. Ion assisted deposition influences film stoichiometry and packing density, which in turn determine optical and mechanical properties of the film material. We discuss two general indicators which appear helpful in predicting the degree to which these occur.

Microstructure and Mechanical Properties of Nanolayered TiN/Cu Thin Films

2003 ◽  
Vol 778 ◽  
Author(s):  
Y.Y. Tse ◽  
G. Abadias ◽  
A. Michel ◽  
C. Tromas ◽  
M. Jaouen
Keyword(s):  
Mechanical Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
X Ray Diffraction ◽  
Depth Sensing ◽  
Transmission Electron ◽  
Beam Sputtering ◽  
Hardness Increase ◽  
Dual Ion Beam Sputtering ◽  
The Relationship

AbstractStructural and mechanical properties of nanoscale TiN/Cu multilayers grown by dual ion beam sputtering with bilayer periods (A) ranging from 2.5 to 50 nm were studied. Both low-angle and high-angle X-ray diffraction (XRD) experiments have been employed to globally characterize the multilayers structure. The microstructure of the multilayers has been scrutinized by high resolution transmission electron microscopy (HRTEM). The effects of interface and bilayer thickness on hardness were investigated by depth-sensing nanoindentation technique. A small hardness increase with decreasing periodicity of the multilayers has been observed. The relationship between the hc/T ratio (hc is the contact depth and T is the total film thickness) and the hardness is established. The correlation between the microstructure and hardness is discussed.

Influence of N2 Proportion on Mechanical Properties of SiCN Thin Films Prepared by DIBSD

2010 ◽  
Vol 97-101 ◽  
pp. 1243-1247 ◽  
Author(s):  
Bo Hong ◽  
Xue Mei Wu ◽  
Lan Jian Zhuge ◽  
Zhao Feng Wu ◽  
Fei Zhou
Keyword(s):  
Mechanical Properties ◽  
Ion Beam ◽  
Ion Source ◽  
Laser Raman Spectroscopy ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Laser Raman ◽  
Beam Sputtering ◽  
Sicn Thin Films ◽  
Dual Ion Beam Sputtering

Amorphous silicon carbide nitride (SiCN) films have been deposited in a dual ion beam sputtering deposition (DIBSD) using a SiC target. Films with various compositions were obtained by changing the nitrogen and argon gas ratio in the assisted ion source. Mechanical properties of the SiCN films were evaluated by Nano-indentation in N2 ambient. Surface morphology of the films was characterized by an Atomic Force Microscope (AFM). The microstructure and chemical bonding correlating with behavior of the films were studied by a Fourier transform infrared spectroscopy (FTIR) and a laser Raman spectroscopy. The results show that N2 proportion in the assisted ion source has a great effect on the structure and properties of the films and the mechanism was discussed in brief.

Effects of Nitrogen on Formation and Properties of Diamondlike Films Synthesized by Dual Ion Beam Deposition

1993 ◽  
Vol 316 ◽  
Author(s):  
Xiaoming He ◽  
Hongwei Song ◽  
Wenzhi Li ◽  
Fuzhai Cui ◽  
Hengde Li ◽  
...  
Keyword(s):  
Tungsten Carbide ◽  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Amorphous Structure ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Diamondlike Carbon ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Beam Deposition

ABSTRACTDiamondlike carbon-nitrogen films on silicon (111) wafer and tungsten carbide plates have been prepared by using dual ion beam sputtering deposition and simultaneous bombardment by N+ with energies of 100-800 eV at room temperature. These films retain their diamondlike characteristics. However, as the nitrogen content increases from 10% at to 20% at., the Auger electron spectroscopy spectra of films change obviously in fine structure and the main Cls peak of carbon atoms in the X-ray photoelectron spectroscopy spectra shifts to 285.65 eV. The maximum hardness of these films on tungsten carbide plates is about 5260 kg/mm2. The films have an amorphous structure and smooth surface. The state of nitrogen in films and its influence on the structure and properties of films are discussed.

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