Surface Effects During Ion Beam Processing of Materials

1995 ◽  
Vol 396 ◽  
Author(s):  
R.S. Averback ◽  
Mai Ghaly ◽  
H. Zhu
Keyword(s):  
Molecular Dynamics ◽  
Metallic Glass ◽  
Ion Implantation ◽  
Surface Topography ◽  
Computer Simulations ◽  
Collective Behavior ◽  
Ion Beam ◽  
Atomic Level ◽  
Surface Studies ◽  
Amorphous Si

AbstractMicrostructural changes of surfaces during ion implantation have been investigated on the atomic level by molecular dynamics computer simulations. Unlike past surface studies, which have been focused on the problem of sputtering, the current work examines the effects of collective materials response on surface topography. Collective behavior has been noted for the crystal interior in the context of thermal spikes, but we show here that it can lead to far more dramatic consequences at the surface. The investigation includes implantation in several metals, but emphasizing Pt, Si and Ge. In addition, the study includes the first simulations of implantations of a metallic glass, CuTi, and amorphous Si.

Crystal Nucleation in Amorphous Si Films on Glass Substrate by Si+ Ion Implantation

1991 ◽  
Vol 230 ◽  
Author(s):  
Tomonori Yamaoka ◽  
Keiji Oyoshi ◽  
Takashi Tagami ◽  
Yasunori Arima ◽  
Shuhei Tanaka
Keyword(s):  
Ion Implantation ◽  
Glass Substrate ◽  
Ion Beam ◽  
Crystal Nucleation ◽  
Projected Range ◽  
Transmission Electron ◽  
Microscopy Investigation ◽  
Amorphous Si ◽  
Si Films ◽  
Almost All

AbstractCrystallization of amorphous Si films on a glass substrate using Si+ ion implantation is investigated. 100keV and 180keV Si+ ion implantations into 600nm-thick amorphous Si layers crystallize half and almost all of the film thicknesses, respectively. This result demonstrates that crystallization by ion implantation, which contains both crystal nucleation and grain growth, is due to ion-solid interaction, and not to “pure” thermal effect by ion beam heating. Furthermore, two distinct regions are observed in transmission electron microscopy investigation of grain size at different depths of crystallized Si/SiO2 multi-layer specimens. The deep region below the projected range is composed of grains smaller than in the shallow region. This result is strongly related with crystal nucleation and growth kinetics by ion implantation.

Molecular dynamics study of atomic-level structure in monatomic metallic glass

2016 ◽  
Vol 443 ◽  
pp. 136-142 ◽  
Author(s):  
S. Trady ◽  
M. Mazroui ◽  
A. Hasnaoui ◽  
K. Saadouni
Keyword(s):  
Molecular Dynamics ◽  
Metallic Glass ◽  
Level Structure ◽  
Atomic Level

Effects of Ion Beam Milling on Surface Topography

1973 ◽  
Vol 31 ◽  
pp. 84-85
Author(s):  
P.G. Pawar ◽  
P. Duhamel ◽  
G.W. Monk
Keyword(s):  
Surface Topography ◽  
Ion Beam ◽  
Solid Material ◽  
Beam Current ◽  
Atomic Mass ◽  
Micro Milling ◽  
Ion Milling ◽  
Controlled Atmospheres ◽  
Milling Operations ◽  
Sufficient Energy

A beam of ions of mass greater than a few atomic mass units and with sufficient energy can remove atoms from the surface of a solid material at a useful rate. A system used to achieve this purpose under controlled atmospheres is called an ion miliing machine. An ion milling apparatus presently available as IMMI-III with a IMMIAC was used in this investigation. Unless otherwise stated, all the micro milling operations were done with Ar+ at 6kv using a beam current of 100 μA for each of the two guns, with a specimen tilt of 15° from the horizontal plane.It is fairly well established that ion bombardment of the surface of homogeneous materials can produce surface topography which resembles geological erosional features.

Interfacial bonding of CuZr metallic glass via oxide: A molecular dynamics study

2021 ◽  
Vol 182 ◽  
pp. 109275
Author(s):  
Mao Zhang ◽  
Hongjun Cai ◽  
Jiacheng Zhang ◽  
Qiaomin Li ◽  
Ying Wang ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Metallic Glass ◽  
Interfacial Bonding

Direct observation of atomic-level fractal structure in a metallic glass membrane

2021 ◽  
Author(s):  
Hongyu Jiang ◽  
Jiyu Xu ◽  
Qinghua Zhang ◽  
Qian Yu ◽  
Laiquan Shen ◽  
...  
Keyword(s):  
Metallic Glass ◽  
Direct Observation ◽  
Fractal Structure ◽  
Atomic Level ◽  
Glass Membrane

Ion beam mixing to study the metallic glass formation of the Cu–Zr system

2010 ◽  
Vol 64 (1) ◽  
pp. 96-98 ◽  
Author(s):  
T.L. Wang ◽  
W.T. Huang ◽  
W.C. Wang ◽  
B.X. Liu
Keyword(s):  
Metallic Glass ◽  
Glass Formation ◽  
Ion Beam ◽  
Ion Beam Mixing

scholarly journals Simulation of Mechanical Deformation and Tribology of Nano-Thin Amorphous Hydrogenated Carbon (a:Ch) Films Using Molecular Dynamics

1996 ◽  
Vol 436 ◽  
Author(s):  
J. N. Glosli ◽  
M. R. Philpott ◽  
J. Belak
Keyword(s):  
Molecular Dynamics ◽  
Substrate Temperature ◽  
Computer Simulations ◽  
Mechanical Deformation ◽  
Porous Graphite ◽  
Pure Carbon ◽  
Substrate Temperatures ◽  
Amorphous Hydrogenated Carbon ◽  
Deposition Energy

AbstractMolecular dynamics computer simulations are used to study the effect of substrate temperature on the microstructure of deposited amorphous hydrogenated carbon (a:CH) films. A transition from dense diamond-like films to porous graphite-like films is observed between substrate temperatures of 400K and 600K for a deposition energy of 20 eV. The dense a:CH film grown at 300K and 20 eV has a hardness (˜50 GPa) about half that of a pure carbon (a:C) film grown under the same conditions.

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