Material-Process Interactions in the Annealing of Gallium Arsenide

1981 ◽  
Vol 4 ◽  
Author(s):  
C. Lawrence Anderson
Keyword(s):  
Gallium Arsenide ◽  
Optical Properties ◽  
Electrical Properties ◽  
Electron Beams ◽  
Pulsed Laser ◽  
Review Article ◽  
Electrical And Optical Properties ◽  
Physical Mechanisms ◽  
Material Process ◽  
Thermal Techniques

ABSTRACTThis review article provides an overview of the current understanding of the physical mechanisms involved in the annealing of ion implanted GaAs by thermal techniques and by CW and pulsed laser and electron beams. The successfulness of these techniques is evaluated in terms of the electrical and optical properties of the annealed layers. Promising areas of investigation for the improvement of the electrical properties of n-type layers produced by pulsed annealing are identified.

The Electrical and Optical Properties of Point and Extended Defects in Silicon Arising from Oxygen Precipitation

2007 ◽  
Vol 131-133 ◽  
pp. 225-232 ◽  
Author(s):  
R. Jones
Keyword(s):  
Optical Properties ◽  
Electrical Properties ◽  
Electrical Activity ◽  
Theoretical Work ◽  
Precipitation Process ◽  
Extended Defects ◽  
Dislocation Loops ◽  
Electrical And Optical Properties ◽  
Oxygen Precipitation ◽  
Oxygen Atoms

Oxygen precipitation in Si is a complex set of processes which has been studied over many years. Here we review theoretical work relating to the precipitation process. At temperatures around 450°C oxygen atoms become mobile and form a family of thermal double donors. The structure of these defects and the origin of their electrical activity is discussed. At temperature around 650°C these donors disappear and there is a growth of SiO2 precipitates along with rod like defects which are extended defects involving Si interstitials. At higher temperatures these collapse into dislocation loops. The structure and electrical properties of the rod like defect are described and compared with those of dislocations.

Structural, electrical and optical properties of Mg-doped CuAlO2 films by pulsed laser deposition

RSC Advances ◽  
2014 ◽  
Vol 4 (78) ◽  
pp. 41294-41300 ◽  
Author(s):  
Y. S. Zou ◽  
H. P. Wang ◽  
S. L. Zhang ◽  
D. Lou ◽  
Y. H. Dong ◽  
...  
Keyword(s):  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Band Gaps ◽  
Laser Deposition ◽  
Electrical And Optical Properties ◽  
Optical Band Gaps ◽  
P Type ◽  
Enhanced Conductivity ◽  
Mg Doped

P-type Mg doped CuAlO2 films with high crystallinity are prepared by pulsed laser deposition followed by annealing, and exhibit enhanced conductivity and tunable optical band gaps.

Effect of thickness on structural, electrical, and optical properties of ZnO: Al films deposited by pulsed laser deposition

2007 ◽  
Vol 101 (3) ◽  
pp. 033713 ◽  
Author(s):  
Bin-Zhong Dong ◽  
Guo-Jia Fang ◽  
Jian-Feng Wang ◽  
Wen-Jie Guan ◽  
Xing-Zhong Zhao
Keyword(s):  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Electrical And Optical Properties

Electrical Properties and Microstructures of Ultraviolet Transparent Ga2O3 Thin Films

2007 ◽  
Vol 561-565 ◽  
pp. 1233-1236
Author(s):  
Yasuhiro Shigetoshi ◽  
Susumu Tsukimoto ◽  
Hidehisa Takeda ◽  
Kazuhiro Ito ◽  
Masanori Murakami
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Optical Properties ◽  
Electrical Properties ◽  
Substrate Temperature ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Partial Pressure Of Oxygen ◽  
Electrical And Optical Properties ◽  
Sputtering Deposition

The electrical and optical properties, and microstructures of 100 nm-thick Ga2O3 films fabricated on Al2O3(0001) substrates by a sputtering deposition were investigated. The partial pressure of oxygen was controlled and the substrate temperature was kept to be 500 °C during deposition. With increasing the oxygen partial pressure, the structures of the Ga2O3 films deposited on the substrates were observed to change from amorphous to crystalline (monoclinic β-type Ga2O3). The transmittance of the Ga2O3 films was measured to be more than 80 % at the visible and ultraviolet regions although the electrical resistivity was high. In order to obtain both low electrical resistivity and high transmittance at the ultraviolet regions, the addition of active dopant elements such as Sn into the Ga2O3 films would be required.

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