Optical Properties of MBE Grown Cubic AlGaN Epilayers and AlGaN/GaN Quantum Well Structures

2000 ◽  
Vol 639 ◽  
Author(s):  
D.J. As ◽  
T. Frey ◽  
M. Bartels ◽  
A. Khartchenko ◽  
D. Schikora ◽  
...  

ABSTRACTCubic AlyGa1−yN/GaN heterostructures on GaAs(001) substrates were grown by radio-frequency plasma-assisted molecular beam epitaxy. High resolution X-ray diffraction, spectroscopic ellipsometry and cathodoluminescence were used to characterize the structural and optical properties of the alloy epilayers. X-ray diffraction reciprocal space maps demonstrate the good crystal quality of the cubic AlyGa1−yN films. Both SE as well as room temperature CL of the AlyGa1−yN epilayer show a linear increase of the band gap with increasing Al-content. A pseudomorphically strained cubic 10 × (2.4 nm GaN/ 4.8 nm Al0.12Ga0.88N) multi-quantum well (MQW) structure has been realized. Cathodoluminescence clearly demonstrates strong radiative recombination due to quantized states in the GaN well layer at a photon energy of 3.323 eV.

2002 ◽  
Vol 722 ◽  
Author(s):  
Young-Hoon KIM ◽  
Chang-Soo KIM ◽  
Sam-Kyu NOH ◽  
Jae-Young LEEM ◽  
Kee-Young LIM ◽  
...  

AbstractThe structural and the optical properties of 10-period In0.15Ga0.85N/GaN multiple quantum wells (MQWs) have been investigated using HRXRD (high-resolution X-ray diffraction) and PL (photoluminescence). For the samples, the barrier thickness was kept constant, 7.5 nm and the well thicknesses were varied, 1.5, 3.0, 4.5, and 6.0 nm. For the structural characterization, an ω/2θ-scan and an ω-scan for GaN (00 2) reflection and a reciprocal space mapping (RSM) around the GaN (10 5) lattice point were employed. The average strain for the MQWs increased as the well thickness increased. The MQW with a 6.0 nm well thickness experienced lattice relaxation and the crystallinity of the sample was poor compared to that of the other samples. MQWs with well thicknesses of 1.5, 3.0 and 4.5 nm, however, maintained lattice coherency with the GaN epilayers underneath, and the critical well thickness for lattice relaxation of the MQWs used in the study was 6.0 nm. The PL spectra showed that the relative emission intensity of the sample with a 6.0 nm well thickness was lower than for the others, a fact consistent with the X-ray results. The emission intensity, therefore, is considered to be affected by defects due to lattice relaxation of the epilayer.


1993 ◽  
Vol 84 (3) ◽  
pp. 475-489
Author(s):  
G. Bauer ◽  
E. Koppensteiner ◽  
P. Hamberger ◽  
J. Nützel ◽  
G. Abstreiter ◽  
...  

1996 ◽  
Vol 221 (1-4) ◽  
pp. 487-493 ◽  
Author(s):  
E. Zolotoyabko ◽  
Y. Finkelstein ◽  
M. Blumina ◽  
D. Fekete

2009 ◽  
Vol 6 (S2) ◽  
pp. S451-S454 ◽  
Author(s):  
Christoph Hums ◽  
Aniko Gadanecz ◽  
Armin Dadgar ◽  
Jürgen Bläsing ◽  
Pierre Lorenz ◽  
...  

1992 ◽  
Vol 46 (11) ◽  
pp. 6947-6954 ◽  
Author(s):  
Nguyen Hong Ky ◽  
J. D. Ganière ◽  
M. Gailhanou ◽  
F. Morier-Genoud ◽  
D. Martin ◽  
...  

1984 ◽  
Vol 142 (1-3) ◽  
pp. 509-512 ◽  
Author(s):  
J.-Y. Marzin ◽  
M. Quiliec ◽  
E.V.K. Rao ◽  
G. Leroux ◽  
L. Goldstein

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