New UV Light Emitter Based on AlGaN Heterostructures with Graded Electron and Hole Injectors

2002 ◽  
Vol 743 ◽  
Author(s):  
M.A.L. Johnson ◽  
J.P. Long ◽  
J. F. Schetzina

ABSTRACTNew ultraviolet (UV) light emitting device structures address the problems of small carrier concentrations and large band-offsets in wide bandgap Aluminum Gallium Nitride (AlGaN) heterostructures through the use of graded epilayers for electron and hole injection. For light emission at 280–290 nm, a multiple-quantum-well separate confinement heterostructure (MQWSCH) employs a graded AlGaN structure for the injection of majority carriers from the metal-semiconductor contact layers into the spacecharge region of the pn-junction with a higher bandgap energy. Sample LED mesa devices were fabricated and have shown light emission of 289 nm under a forward bias of 12V (20mA). These results provide a ‘proof-of-concept’ for this new graded device structure which can be employed for the development of both UV-LEDs and laser diodes.

2012 ◽  
Vol 108 (4) ◽  
pp. 771-776 ◽  
Author(s):  
Lei Liu ◽  
Lei Wang ◽  
Cimang Lu ◽  
Ding Li ◽  
Ningyang Liu ◽  
...  

2012 ◽  
Vol 21 (6) ◽  
pp. 068506 ◽  
Author(s):  
Le-Juan Wu ◽  
Shu-Ti Li ◽  
Chao Liu ◽  
Hai-Long Wang ◽  
Tai-Ping Lu ◽  
...  

2005 ◽  
Vol 892 ◽  
Author(s):  
M. Asif Khan

AbstractIn this paper we will describe the problems in growth and fabrication of deep UV LED devices and the approaches that we have used to grow AlGaN-based multiple quantum well deep UV LED structures and to overcome issues of doping efficiency, cracking, and slow growth rates both for the n- and the p-type layers of the device structures. Several innovations in structure growth, device structure design and fabrication and packaging have led to the fabrication of devices with emission from 250-300 nm and cw-milliwatt powers at pump currents of only 20 mA (Vf ≤ 6 V). Record wall plug efficiencies above 1.5 % are now achievable for devices with emission at 280 nm. Thermal management and a proper device design are not only key factors in achieving these record performance numbers but are also crucial to device reliability. We will also discuss some of our initial research to clarify the factors influencing the lifetime of the deep UV LEDs. In addition to our own work, we will review the results from the excellent research carried out at several other laboratories worldwide.


Author(s):  
Shweta Natarajan ◽  
Bobby G. Watkins ◽  
Vinod Adivarahan ◽  
Asif Khan ◽  
Samuel Graham

The temperature rise in LEDs is an important parameter that must be determined for both thermal management and device lifetime/reliability assessment. Commonly used indirect methods of measuring the device temperature either estimate the multiple quantum well (MQW) temperature based on measuring temperature dependent device characteristics (e.g., forward voltage and electroluminescence methods), or they measure the average temperature across the device structure using optical methods such as infrared (IR) thermography and thermoreflectance. However, none give true insight into the vertical distribution of temperature in these structures. In this study, Raman spectroscopy is applied for the first time to operating UV LEDs to give the temperature rise in discrete layers within the LED device structure, going from the growth substrate to layers adjacent to theMQWs. Comparisons are made with IR themography to contrast with this depth sensitive measurement technique. It was observed that the peak temperatures in the device were much higher than the temperatures indicated by IR while the averaged temperatures through the structure compared favorably. Additional comparisons to electroluminescence measurements were also made which compared favorably with the peak temperatures found by Raman Spectroscopy.


2013 ◽  
Vol 411-414 ◽  
pp. 1654-1659
Author(s):  
Yang Li ◽  
Lie Feng Feng ◽  
Cun Da Wang ◽  
Qiong Yong Xing

The accurate electrical properties of semiconductor GaN based blue Light-Emitting Diodes (LED) with Multiple-Quantum Well (MQW) structure and GaAsP based red LED, were measured by single Capacitance-Voltage (C-V) method and single Current-Voltage (I-V) method at large forward bias. After comparing the experimental results, we found that the apparent capacitance Cp of GaN based blue LED and GaAsP based red LED measured by C-V method display obviously negative value at large forward bias and low frequency, which is in conflict with the well known Shockley's p-n junction theory and model. Besides, the precise Characterization of apparent capacitance Cp and apparent conductance Gp is obtained.


2002 ◽  
Vol 41 (Part 2, No. 10B) ◽  
pp. L1146-L1148 ◽  
Author(s):  
Maxim Shatalov ◽  
Ashay Chitnis ◽  
Alexey Koudymov ◽  
Jianping Zhang ◽  
Vinod Adivarahan ◽  
...  

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