VISUALIZATION OF PROCESSES CAUSED BY DIRECT CURRENT PLASMA DISCHARGE IN HYPERSONIC FLOW OVER FLAT PLATE

2011 ◽  
Vol 1 (3) ◽  
Author(s):  
Hironobu Watanabe ◽  
Kojiro Suzuki
Keyword(s):  
Flat Plate ◽  
Hypersonic Flow ◽  
Direct Current ◽  
Plasma Discharge ◽  
Direct Current Plasma

Effects of Plasma Discharge on Hypersonic Flow over Flat Plate

2010 ◽  
Author(s):  
Yasumasa Watanabe ◽  
Osamu Imamura ◽  
Kojiro Suzuki
Keyword(s):  
Flat Plate ◽  
Hypersonic Flow ◽  
Plasma Discharge

Mechanism of the direct current plasma discharge decomposition of disilane

1984 ◽  
Vol 88 (15) ◽  
pp. 3282-3287 ◽  
Author(s):  
P. A. Longeway ◽  
H. A. Weakliem ◽  
R. D. Estes
Keyword(s):  
Direct Current ◽  
Plasma Discharge ◽  
Direct Current Plasma

scholarly journals Raman scattering analysis of silicon dioxide single crystal treated by direct current plasma discharge

2011 ◽  
Vol 98 (5) ◽  
pp. 051503 ◽  
Author(s):  
D. M. Popovic ◽  
V. Milosavljevic ◽  
A. Zekic ◽  
N. Romcevic ◽  
S. Daniels
Keyword(s):  
Raman Scattering ◽  
Silicon Dioxide ◽  
Single Crystal ◽  
Direct Current ◽  
Plasma Discharge ◽  
Direct Current Plasma

Characterization of an Improved dc Plasma Excitation Source

1980 ◽  
Vol 34 (1) ◽  
pp. 24-30 ◽  
Author(s):  
G. N. Coleman ◽  
W. P. Braun ◽  
A. M. Allen
Keyword(s):  
Thermal Conductivity ◽  
Direct Current ◽  
Direct Evidence ◽  
Plasma Jet ◽  
Sample Introduction ◽  
Direct Current Plasma ◽  
Actual Mechanism ◽  
Improved Stability ◽  
Plasma Excitation

Several modifications of the direct current plasma jet have resulted in significantly enhanced analysis capabilities. Reducing the electrode angle, decreasing the aerosol chimney size, and operating in a diffuse mode with helium have provided improved stability, sensitivity, freedom from interferences, and detection limits. While the actual mechanism of the helium enhancement is not clear, no direct evidence was found which supports participation in the excitation step. Rather, improved desolvation, vaporization and possibly sample introduction result from the thermal conductivity of helium being much greater than that of argon.

Control of implantation area in direct-current plasma immersion ion implantation (DC-PIII)

2003 ◽  
Vol 31 (3) ◽  
pp. 356-361 ◽  
Author(s):  
R.K. Fu ◽  
Pai Peng ◽  
Xuchu Zeng ◽  
D.T. Kwok ◽  
P.K. Chu
Keyword(s):  
Ion Implantation ◽  
Direct Current ◽  
Direct Current Plasma ◽  
Plasma Immersion Ion Implantation
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