Simulation of polyatomic discharges for thin film deposition processes in low pressure plasma reactors

2021 ◽  
Author(s):  
Kallol Bera
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Low Pressure ◽  
Film Deposition ◽  
Plasma Reactors ◽  
Pressure Plasma ◽  
Low Pressure Plasma ◽  
Deposition Processes

Deposition of diamond-like carbon

1993 ◽  
Vol 342 (1664) ◽  
pp. 277-286 ◽  
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Diamond Like Carbon ◽  
Hydrogenated Amorphous Carbon ◽  
Sizeable Fraction ◽  
Deposition Processes ◽  
Hydrogenated Amorphous

Diamond-like carbon refers to forms of amorphous carbon and hydrogenated amorphous carbon containing a sizeable fraction of sp 3 bonding, which makes them mechanically hard, infrared transparent and chemically inert. This paper discusses the various thin film deposition processes used to form diamond-like carbon and the deposition mechanisms responsible for promoting the metastable sp 3 bonding.

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