Development of Highly Selective Oxidation Catalysts by Atomic Layer Deposition

Precisely-controlled synthesis of Au@Pd core–shell bimetallic catalyst via atomic layer deposition for selective oxidation of benzyl alcohol

Journal of Catalysis ◽

10.1016/j.jcat.2015.01.019 ◽

2015 ◽

Vol 324 ◽

pp. 59-68 ◽

Cited By ~ 89

Author(s):

Hengwei Wang ◽

Chunlei Wang ◽

Huan Yan ◽

Hong Yi ◽

Junling Lu

Keyword(s):

Atomic Layer Deposition ◽

Benzyl Alcohol ◽

Selective Oxidation ◽

Bimetallic Catalyst ◽

Atomic Layer ◽

Core Shell ◽

Controlled Synthesis ◽

Oxidation Of Benzyl Alcohol ◽

Layer Deposition

Preparation of manganese oxide immobilized on SBA-15 by atomic layer deposition as an efficient and reusable catalyst for selective oxidation of benzyl alcohol in the liquid phase

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2015.02.011 ◽

2015 ◽

Vol 155 ◽

pp. 136-146 ◽

Cited By ~ 18

Author(s):

Vahid Mahdavi ◽

Mahdieh Mardani

Keyword(s):

Liquid Phase ◽

Atomic Layer Deposition ◽

Manganese Oxide ◽

Benzyl Alcohol ◽

Selective Oxidation ◽

Atomic Layer ◽

Reusable Catalyst ◽

Oxidation Of Benzyl Alcohol ◽

Layer Deposition

Surface characteristics and activity in selective oxidation of -xylene of supported VO catalysts prepared by standard impregnation and atomic layer deposition

Catalysis Today ◽

10.1016/j.cattod.2004.06.142 ◽

2004 ◽

Vol 96 (4) ◽

pp. 187-194 ◽

Cited By ~ 34

Author(s):

A GERVASINI ◽

P CARNITI ◽

J KERANEN ◽

L NIINISTO ◽

A AUROUX

Keyword(s):

Atomic Layer Deposition ◽

Selective Oxidation ◽

Surface Characteristics ◽

Atomic Layer ◽

Layer Deposition

Mechanistic studies of atomic layer deposition on oxidation catalysts – AlOx and POx deposition

Physical Chemistry Chemical Physics ◽

10.1039/d0cp02572k ◽

2020 ◽

Vol 22 (32) ◽

pp. 17999-18006 ◽

Cited By ~ 1

Author(s):

Kristian Knemeyer ◽

Mar Piernavieja Hermida ◽

Piyush Ingale ◽

Johannes Schmidt ◽

Jutta Kröhnert ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Redox Chemistry ◽

Mechanistic Studies ◽

Oxidation Catalysts ◽

Phosphorus Oxide ◽

Layer Deposition

Atomic layer deposition of phosphorus oxide on divanadium pentoxide powder undergoes controllable redox chemistry.

Hydrogen permeation properties of CrxCy@Cr2O3/Al2O3 composite coating derived from selective oxidation of a Cr C alloy and atomic layer deposition

International Journal of Hydrogen Energy ◽

10.1016/j.ijhydene.2018.08.192 ◽

2018 ◽

Vol 43 (45) ◽

pp. 21133-21141 ◽

Cited By ~ 10

Author(s):

Jipeng Wang ◽

Zhaoxia Lu ◽

Yunhan Ling ◽

Rongguang Wang ◽

Yunhui Li ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Composite Coating ◽

Selective Oxidation ◽

Hydrogen Permeation ◽

Atomic Layer ◽

Layer Deposition ◽

Al2o3 Composite ◽

Permeation Properties

Stabilization of Polyoxometalate Water Oxidation Catalysts on Hematite by Atomic Layer Deposition

ACS Applied Materials & Interfaces ◽

10.1021/acsami.7b12168 ◽

2017 ◽

Vol 9 (40) ◽

pp. 35048-35056 ◽

Cited By ~ 21

Author(s):

Sarah M. Lauinger ◽

Brandon D. Piercy ◽

Wei Li ◽

Qiushi Yin ◽

Daniel L. Collins-Wildman ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Water Oxidation ◽

Atomic Layer ◽

Oxidation Catalysts ◽

Layer Deposition

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

Trends in Chemistry ◽

10.1016/j.trechm.2020.11.002 ◽

2021 ◽

Vol 3 (1) ◽

pp. 59-71

Author(s):

Degao Wang ◽

Qing Huang ◽

Weiqun Shi ◽

Wei You ◽

Thomas J. Meyer

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Dye Sensitized ◽

Layer Deposition

Growth and Characteristics of ZnO Nanotube Arrays on Si Substrate by Atomic Layer Deposition in Anodic Aluminum Oxide

10.1557/proc-1109-b09-09 ◽

2008 ◽

Author(s):

Soo Jin Chua ◽

Miao Wang ◽

Han Gao ◽

Carl V. Thompson ◽

Lee Kheng Tan

Keyword(s):

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Anodic Aluminum Oxide ◽

Atomic Layer ◽

Nanotube Arrays ◽

Si Substrate ◽

Anodic Aluminum ◽

Zno Nanotube ◽

Layer Deposition

Atomic Layer Deposition on Active Pharmaceutical Particles

10.26226/morressier.57d6b2bed462b8028d88d866 ◽

2016 ◽

Author(s):

Tommi Kääriäinen

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition

Workfunction of Al-Doped ZnO Films Deposited by Atomic Layer Deposition

10.26434/chemrxiv.5850003 ◽

2018 ◽

Author(s):

Peter George Gordon ◽

Goran Bacic ◽

Gregory P. Lopinski ◽

Sean Thomas Barry

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Atomic Ratio ◽

Aluminum Concentration ◽

Zno Films ◽

Transparent Conductor ◽

Kelvin Probe ◽

Layer Deposition ◽

Earth Abundant ◽

Doped Zno

Al-doped ZnO (AZO) is a promising earth-abundant alternative to Sn-doped In2O3 (ITO) as an n-type transparent conductor for electronic and photovoltaic devices; AZO is also more straightforward to deposit by atomic layer deposition (ALD). The workfunction of this material is particularly important for the design of optoelectronic devices. We have deposited AZO films with resistivities as low as 1.1 x 10-3 Ωcm by ALD using the industry-standard precursors trimethylaluminum (TMA), diethylzinc (DEZ), and water at 200◦C. These films were transparent and their elemental compositions showed reasonable agreement with the pulse program ratios. The workfunction of these films was measured using a scanning Kelvin Probe (sKP) to investigate the role of aluminum concentration. In addition, the workfunction of AZO films prepared by two different ALD recipes were compared: a “surface” recipe wherein the TMA was pulsed at the top of each repeating AZO stack, and a interlamellar recipe where the TMA pulse was introduced halfway through the stack. As aluminum doping increases, the surface recipe produces films with a consistently higher workfunction as compared to the interlamellar recipe. The resistivity of the surface recipe films show a minimum at a 1:16 Al:Zn atomic ratio and using an interlamellar recipe, minimum resistivity was seen at 1:19. The film thicknesses were characterized by ellipsometry, chemical composition by EDX, and resistivity by four-point probe.