Study of Oxide Film Formed in a Pre Cracked CT Specimen of AISI 304L During a Rising Displacement Test in 288°C Water

2009 ◽  
Vol 2 (1) ◽  
pp. 32-36 ◽  
Author(s):  
Angeles Diaz-Sanchez ◽  
Victor M. Castano
Keyword(s):  
Oxide Film ◽  
Aisi 304L

Oxide Film Characterization after the crack propagation in CT specimens of AISI 304L under Hydrogen Water Chemistry Condition.

2016 ◽  
Vol 1814 ◽  
Author(s):  
Ángeles Díaz Sánchez ◽  
Aida Contreras Ramírez ◽  
Carlos Arganis Juárez
Keyword(s):  
Oxide Film ◽  
Crack Propagation ◽  
Water Chemistry ◽  
Degradation Mechanism ◽  
Electrochemical Corrosion ◽  
General Term ◽  
Test Method ◽  
Feed Water ◽  
Aisi 304L ◽  
Hydrogen Water

ABSTRACTStress Corrosion Cracking (SCC) in a general term describing stressed alloy fracture that occurs by crack propagation in specifically environments, and has the appearance of brittle fracture, yet it can occur in ductile materials like AISI 304L used in internal components of Boiling Water Reactors (BWR). The high levels of oxygen and hydrogen peroxide generated during an operational Normal Water Condition (NWC) promotes an Electrochemical Corrosion Potential (ECP), enough to generate SCC in susceptible materials. Changes in water chemistry have been some of the main solutions for mitigate this degradation mechanism, and one of these changes is reducing the ECP by the injection of Hydrogen in the feed water of the reactor; this addition moves the ECP below a threshold value, under which the SCC is mitigated (-230mV vs SHE). This paper shows the characterization by Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD) and Raman Spectroscopy of the oxide film formed in to a crack propagated during a Rising Displacement Test method (RDT), on Hydrogen Water Chemistry (HWC) conditions: 20 ppb O2, 125 ppb H2, P=8MPa, T=288°C, using a CT specimen of austenitic stainless steel AISI 304L sensitized. The characterization allowed identifying the magnetite formation since an incipient way, until very good formed magnetite crystals.

Deposited emulsion particles in the pores of aluminum oxide film

1978 ◽  
Vol 36 (1) ◽  
pp. 450-451
Author(s):  
Michio Ashida ◽  
Yasukiyo Ueda
Keyword(s):  
Oxide Film ◽  
Acid Solution ◽  
Barrier Layer ◽  
Colloidal Particles ◽  
Oxalic Acid Solution ◽  
Anodic Oxide ◽  
Anodic Oxide Film ◽  
Carbon Replica ◽  
Sectioning Method ◽  
Thin Sectioning

An anodic oxide film is formed on aluminum in an acidic elecrolyte during anodizing. The structure of the oxide film was observed directly by carbon replica method(l) and ultra-thin sectioning method(2). The oxide film consists of barrier layer and porous layer constructed with fine hexagonal cellular structure. The diameter of micro pores and the thickness of barrier layer depend on the applying voltage and electrolyte. Because the dimension of the pore corresponds to that of colloidal particles, many metals deposit in the pores. When the oxide film is treated as anode in emulsion of polyelectrolyte, the emulsion particles migrate onto the film and deposit on it. We investigated the behavior of the emulsion particles during electrodeposition.Aluminum foils (99.3%) were anodized in either 0.25M oxalic acid solution at 30°C or 3M sulfuric acid solution at 20°C. After washing with distilled water, the oxide films used as anode were coated with emulsion particles by applying voltage of 200V and then they were cured at 190°C for 30 minutes.

Surface Microstructure Evolution Upon Silicidation of Ni(Pt) and the Different Responses to Metal Etch

2013 ◽  
Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxide Film ◽  
Microstructure Evolution ◽  
Depth Profiling ◽  
Surface Microstructure ◽  
The Difference ◽  
Surface Microstructures ◽  
Pt Films

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.

Hydrogen diffusion kinetics under different conditions applied to VT6 alloy

2020 ◽  
pp. 98-107
Author(s):  
E. I. Maslikova ◽  
V. D. Andreeva ◽  
E. L. Alekseeva ◽  
Yu. A. Yakovlev
Keyword(s):  
Heat Treatment ◽  
Oxide Film ◽  
Titanium Alloys ◽  
Hydrogen Diffusion ◽  
Heat Treating ◽  
Protective Atmosphere ◽  
Diffusion Kinetics ◽  
Hydrogen Charging ◽  
Hydride Formation ◽  
Different Types

Research of hydrogen diffusion in VT6 alloy is carried out considering different types of heat treating and hydrogen charging. The influence of microalloying on the susceptibility to hydride formation and embrittlement of titanium alloys is analyzed, and also effects of an oxide film on hydrogen charging during heat treatment without protective atmosphere, are studied.

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