Влияние структурных свойств на электросопротивление тонких пленок Al/Ag в процессе твердофазной реакции

Based on the study of a solid-state reaction process in Al/Ag thin films (the atomic ratio being Al:Ag=1:3) carried out by in situ electron diffraction method and electrical resistivity measurements, the reaction initiation temperature has been determined and a model of structural phase transitions occurring during the solid-state reaction has been proposed. The solid-state reaction begins at 70°C with the formation of an Al-Ag solid solution at the interface of aluminum and silver nanolayers. It has been found that in the reaction process intermetallic compounds γ-Ag2Al => µ-Ag3Al are successively formed. It has been established that for the formation of the µ-Ag3Al phase in thin films (up to 100 nm) the following is necessary: first, significant excess of silver over aluminum in the atomic composition, second, the formation of the µ-Ag3Al phase begins only after all the FCC aluminum has reacted. The work was supported by the Russian Science Foundation (grant #18-13-00080).

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In Situ Electron Diffraction and Resistivity Characterization of Solid State Reaction Process in Cu/Al Bilayer Thin Films

Metallurgical and Materials Transactions A ◽

10.1007/s11661-019-05602-5 ◽

2020 ◽

Vol 51 (3) ◽

pp. 1428-1436 ◽

Cited By ~ 3

Author(s):

Evgeny T. Moiseenko ◽

Roman R. Altunin ◽

Sergey M. Zharkov

Keyword(s):

Thin Films ◽

Solid State ◽

Electron Diffraction ◽

Solid State Reaction ◽

Reaction Process

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In situ catalytic formation of graphene-like graphitic layer decoration on Na3V2−xGax(PO4)3 (0 ≤ x ≤ 0.6) for ultrafast and high energy sodium storage

Journal of Materials Chemistry A ◽

10.1039/c8ta11890f ◽

2019 ◽

Vol 7 (9) ◽

pp. 4660-4667 ◽

Cited By ~ 12

Author(s):

Qiao Hu ◽

Jia-Ying Liao ◽

Xiao-Dong He ◽

Shuo Wang ◽

Li-Na Xiao ◽

...

Keyword(s):

Solid State ◽

Solid State Reaction ◽

High Energy ◽

Reaction Process ◽

Graphitic Layer ◽

Sodium Storage

A series of Na3V2−xGax(PO4)3 (x = 0, 0.1, 0.2, 0.4 and 0.6) with in situ catalytic formation of graphene-like graphitic layer decoration are synthesized via a solid-state reaction process.

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Structural Phase Transformations in Al/Pt Bilayer Thin Films during the Solid-State Reaction

Physics of the Solid State ◽

10.1134/s106378341807003x ◽

2018 ◽

Vol 60 (7) ◽

pp. 1413-1418 ◽

Cited By ~ 5

Author(s):

R. R. Altunin ◽

E. T. Moiseenko ◽

S. M. Zharkov

Keyword(s):

Thin Films ◽

Solid State ◽

Phase Transformations ◽

Solid State Reaction ◽

Structural Phase ◽

Structural Phase Transformations

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Formation of Nickel Ferrite Films by Solid-State Reaction

Microscopy and Microanalysis ◽

10.1017/s1431927600010588 ◽

1997 ◽

Vol 3 (S2) ◽

pp. 739-740

Author(s):

Matthew T. Johnson ◽

Paul G. Kotula ◽

C. Barry Carter

Keyword(s):

Thin Films ◽

Solid State ◽

Solid State Reaction ◽

Nickel Ferrite ◽

Elevated Temperatures ◽

Film Growth ◽

Ex Situ ◽

First Case ◽

Morphological Differences

Nickel ferrite (NiFe2O4) thin films are of potential interest for magnetic applications. In the present study, the production of NiFe2O4 by solid-state reaction between thin films of hematite (α-Fe2O3) and nickel oxide (NiO) on (0001) sapphire (α-Fe2O3) substrates has been examined. The NiFe2O4 thin films were prepared by two different methods. In the first case the NiFe2O4film was grown in situ in the deposition system, while in the second case the NiFe2O4 film was formed ex situ by reacting at elevated temperatures in air. These two methods of reaction lead to interesting morphological differences in the ferrite layers.Epilayers of α-Fe2O3 followed by NiO were deposited onto (0001) α-Al2O3 by pulsed-laser deposition (PLD) in 6 mTorr O2. NiFe2O4 films were obtained by reacting the starting films in two different ways: in situ (during film growth) and ex situ.. In both cases, the α-Fe2O3 films were grown under the same conditions while those for the deposition of the NiO layers were different.

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