Peculiarities of Intermetallic Phase Formation in the Process of a Solid State Reaction in (Al/Cu)n Multilayer Thin Films

JOM ◽  
2021 ◽  
Author(s):  
Evgeny T. Moiseenko ◽  
Sergey M. Zharkov ◽  
Roman R. Altunin ◽  
Oleg V. Belousov ◽  
Leonid A. Solovyov ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Phase Formation ◽  
Solid State Reaction ◽  
Intermetallic Phase ◽  
Multilayer Thin Films

scholarly journals Correction to: Peculiarities of Intermetallic Phase Formation in the Process of a Solid State Reaction in (Al/Cu)n Multilayer Thin Films

JOM ◽  
2021 ◽  
Author(s):  
Evgeny T. Moiseenko ◽  
Sergey M. Zharkov ◽  
Roman R. Altunin ◽  
Oleg V. Belousov ◽  
Leonid A. Solovyov ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Phase Formation ◽  
Solid State Reaction ◽  
Intermetallic Phase ◽  
Multilayer Thin Films

Intermetallic phase formation in nanometric Ni/Al multilayer thin films

2008 ◽  
Vol 16 (9) ◽  
pp. 1061-1065 ◽  
Author(s):  
J. Noro ◽  
A.S. Ramos ◽  
M.T. Vieira
Keyword(s):  
Thin Films ◽  
Phase Formation ◽  
Intermetallic Phase ◽  
Multilayer Thin Films

scholarly journals Topotaxial growth of Ti2AlN by solid state reaction in AlN∕Ti(0001) multilayer thin films

2007 ◽  
Vol 90 (17) ◽  
pp. 174106 ◽  
Author(s):  
C. Höglund ◽  
M. Beckers ◽  
N. Schell ◽  
J. v. Borany ◽  
J. Birch ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Solid State Reaction ◽  
Multilayer Thin Films

Formation of amorphous and crystalline phases, and phase transition by solid-state reaction in Zr/Si multilayer thin films

1995 ◽  
Vol 269 (1-2) ◽  
pp. 102-107 ◽  
Author(s):  
Jae-Yeob Shim ◽  
Joon-Seop Kwak ◽  
Eung-Jun Chi ◽  
Hong-Koo Baik ◽  
Sung-Man Lee
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Solid State ◽  
Solid State Reaction ◽  
Multilayer Thin Films ◽  
Crystalline Phases

Characterization of reactive phase formation in sputter-deposited Ni/Al multilayer thin films using TEM

1996 ◽  
Vol 54 ◽  
pp. 1000-1001
Author(s):  
G. Lucadamo ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Phase Formation ◽  
Dark Field ◽  
Nickel Layer ◽  
Multilayer Thin Films ◽  
Cross Sectional ◽  
Dark Field Imaging ◽  
Transmission Electron ◽  
Sputter Deposited ◽  
Constant Heating

The subject of reactive phase formation in multilayer thin films of varying periodicity has stimulated much research over the past few years. Recent studies have sought to understand the reactions that occur during the annealing of Ni/Al multilayers. Dark field imaging from transmission electron microscopy (TEM) studies in conjunction with in situ x-ray diffraction measurements, and calorimetry experiments (isothermal and constant heating rate), have yielded new insights into the sequence of phases that occur during annealing and the evolution of their microstructure.In this paper we report on reactive phase formation in sputter-deposited lNi:3Al multilayer thin films with a periodicity A (the combined thickness of an aluminum and nickel layer) from 2.5 to 320 nm. A cross-sectional TEM micrograph of an as-deposited film with a periodicity of 10 nm is shown in figure 1. This image shows diffraction contrast from the Ni grains and occasionally from the Al grains in their respective layers.

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

scholarly journals Phase Evolution and Amorphous Stability upon Solid-State Reaction in Superlattice-Like Ge–Sb–Te Combinatorial Thin Films

2020 ◽  
Vol 2 (12) ◽  
pp. 3880-3888
Author(s):  
Jian Hui ◽  
Qingyun Hu ◽  
Yuxi Luo ◽  
Tianxing Lai ◽  
Zhan Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Solid State Reaction ◽  
Phase Evolution
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