scholarly journals A Mechanism of the Anodic Passivation of Nickel in Acid Solution –Higher Valence Oxide Film Theory–

1961 ◽  
Vol 2 (2) ◽  
pp. 113-119 ◽  
Author(s):  
Norio Sato ◽  
Go Okamoto
Keyword(s):  
Oxide Film ◽  
Acid Solution ◽  
Film Theory ◽  
Anodic Passivation

Deposited emulsion particles in the pores of aluminum oxide film

1978 ◽  
Vol 36 (1) ◽  
pp. 450-451
Author(s):  
Michio Ashida ◽  
Yasukiyo Ueda
Keyword(s):  
Oxide Film ◽  
Acid Solution ◽  
Barrier Layer ◽  
Colloidal Particles ◽  
Oxalic Acid Solution ◽  
Anodic Oxide ◽  
Anodic Oxide Film ◽  
Carbon Replica ◽  
Sectioning Method ◽  
Thin Sectioning

An anodic oxide film is formed on aluminum in an acidic elecrolyte during anodizing. The structure of the oxide film was observed directly by carbon replica method(l) and ultra-thin sectioning method(2). The oxide film consists of barrier layer and porous layer constructed with fine hexagonal cellular structure. The diameter of micro pores and the thickness of barrier layer depend on the applying voltage and electrolyte. Because the dimension of the pore corresponds to that of colloidal particles, many metals deposit in the pores. When the oxide film is treated as anode in emulsion of polyelectrolyte, the emulsion particles migrate onto the film and deposit on it. We investigated the behavior of the emulsion particles during electrodeposition.Aluminum foils (99.3%) were anodized in either 0.25M oxalic acid solution at 30°C or 3M sulfuric acid solution at 20°C. After washing with distilled water, the oxide films used as anode were coated with emulsion particles by applying voltage of 200V and then they were cured at 190°C for 30 minutes.

Effect of Experimental Parameters on Passivation Phenomena of Ti6Al4V Alloy in Acid Solution

2016 ◽  
Vol 710 ◽  
pp. 204-209
Author(s):  
Elamine Nouicer ◽  
Fatima Zohra Benlahreche ◽  
Abdelmadjid Nouicer
Keyword(s):  
Oxide Film ◽  
Acid Solution ◽  
Corrosion Potential ◽  
Large Range ◽  
Electrochemical Impedance ◽  
Ti6al4v Alloy ◽  
Paper Study ◽  
Transfer Resistance ◽  
Experimental Parameters ◽  
Increasing Trend

This paper study the effect of scan rates and imposed potential on the growth of the oxide film on the Ti6Al4V alloy surface in acid solution .Polarization curves, plotted at different scan rates show a large range of passivation, with no occurrence of transpassivation . It was found that the scan rate have not a significant effect on the passivation phenomenon. However, it influences the corrosion potential and the current density. Electrochemical impedance spectroscopy results show that the system behaviour is purely capacitive. The increasing trend in transfer resistance, film thickness and the exponent n with the imposed potential is due to the growth of a passive and compact oxide film.

scholarly journals Lattice images of porous anodic oxide film formed on aluminum in chromic acid solution.

1989 ◽  
Vol 40 (12) ◽  
pp. 1361-1365
Author(s):  
Sachiko ONO ◽  
Tomoko KAWAGUCHI ◽  
Hideki ICHINOSE ◽  
Yoichi ISHIDA ◽  
Noboru MASUKO
Keyword(s):  
Oxide Film ◽  
Acid Solution ◽  
Chromic Acid ◽  
Anodic Oxide ◽  
Anodic Oxide Film ◽  
Lattice Images

Investigation on Properties of Anodized 7075 Slurry Cast Aluminum after Sealing

2018 ◽  
Vol 936 ◽  
pp. 187-191
Author(s):  
Apichaya Khunphet ◽  
Somjai Janudom ◽  
Narissara Mahathaninwong
Keyword(s):  
Corrosion Resistance ◽  
Sulfuric Acid ◽  
Oxide Film ◽  
Acid Solution ◽  
Potassium Dichromate ◽  
Hot Water ◽  
Cast Aluminum ◽  
Porous Oxide ◽  
Nickel Fluoride ◽  
Al Oxide

This work investigated the effects of sealing agents on properties of 7075 slurry cast substrate anodized in 1M sulfuric acid solution. The sealing agents tested were hot water, potassium dichromate, teflon, and nickel fluoride. It was found that anodized 7075 slurry cast Al oxide film sealed with teflon gave the highest hardness and the best corrosion resistance. It is possible that the porous oxide film was plugged by teflon, reducing porosity more than hot water, potassium dichromate, or nickel fluoride sealing.

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