scholarly journals Electrical and Photoelectric Properties of Heterojunctions MoOx/n-Cd1-xZnxTe

The paper presents the results of studies of the optical and electrical properties of МоOx/n-Cd1-хZnхTe semiconductor heterojunctions made by depositing MoOx films on a pre-polished surface of n-Cd1-хZnхTe plates (5 × 5 × 0.7 mm3) in a universal vacuum installation Leybold - Heraeus L560 using reactive magnetron sputtering of a pure Mo target. Such studies are of great importance for the further development of highly efficient devices based on heterojunctions for electronics and optoelectronics. The fabricated МоOx/n‑Cd1‑хZnхTe heterojunctions have a large potential barrier height at room temperature (φ0 = 1.15 eV), which significantly exceeds the analogous parameter for the МоOx/n-CdTe heterojunction (φ0 = 0.85 eV). The temperature coefficient of the change in the height of the potential barrier was experimentally determined to be d(φ0)/dT = -8.7·10-3 eV K, this parameter is four times greater than the temperature coefficient of change in the height of the potential barrier for MoOx/n-CdTe heterostructures. The greater value of the potential barrier height of the МоOx/n-Cd1-хZnхTe heterojunction is due to the formation of an electric dipole at the heterointerface due to an increase in the concentration of surface states in comparison with MoOx/n-CdTe heterostructures, and this is obviously associated with the presence of zinc atoms in the space charge region and at the metallurgical boundary section of the heteroboundary. In МоOx/n‑Cd1-хZnхTe heterojunctions, the dominant mechanisms of current transfer are generation-recombination and tunneling-recombination with the participation of surface states, tunneling with forward bias, and tunneling with reverse bias. It was found that МоOx/n-Cd1-хZnхTe heterojunctions, which have the following photoelectric parameters: open circuit voltage Voc = 0.3 V, short circuit current Isc = 1.2 mA/cm2, and fill factor FF = 0.33 at an illumination intensity of 80 mW/cm2 are promising for the manufacture of detectors of various types of radiation. The measured and investigated impedance of the МоOx/n-Cd1-хZnхTe heterojunction at various reverse biases, which made it possible to determine the distribution of the density of surface states and the characteristic time of their charge-exchange, which decrease with increasing reverse bias.

The paper presents the results of studies of the effect of silicon surface treatment on the electrical and photoelectric properties of nanostructured MoOx/n-Si heterojunctions. The nanostructured heterojunctions MoOx/n-Si, were prepared by deposition of thin films of molybdenum oxide (n-type conductivity) by reactive magnetron sputtering in the universal vacuum system Leybold Heraeus L560 on the nanostructured silicon substrates (n-type conductivity), which were made by chemical etching with the assistance of silver nanoparticles. Dark and light volt-ampere (I – V) characteristics of the heterojunctions under study were measured, the value of the potential barrier height, the values of the serial Rs and the shunt Rsh resistance at room temperature were determined. It was established that the silicon surface treatment does not affect the potential barrier height, but significantly affects the values of serial Rs and shunt Rsh resistance. The electrical and photoelectric properties of the obtained structures were investigated, the dominant mechanisms of current transfer through the heterostructures under forward bias are well described in the framework of emission-recombination and tunneling models with the presence of interface states. The main mechanism for the charge carrier transport through heterojunctions with the reverse bias is the Frenkel–Pool emission. Investigation of photoelectric properties of heterojunctions MoOx/n-Si was carried out at illumination by white light with intensity Popt = 80 mW/сm2. It was established that the heterostructure No.5 MoOx/n-Si with grown nanowires and etched silver nanoparticles has a maximum open-circuit voltage Voc = 0.17 V, short-circuit current density Isc = 10 mA/cm2. The possibilities of using the obtained heterostructures as photodiodes were analyzed.


2016 ◽  
Vol 18 (9) ◽  
pp. 6901-6912 ◽  
Author(s):  
Hailiang Dong ◽  
Jing Sun ◽  
Shufang Ma ◽  
Jian Liang ◽  
Taiping Lu ◽  
...  

The effect of the height of the potential barrier on the confined level of carrier transport was studied in InGaAs/GaAsP MQWs.


2004 ◽  
Vol 99 (1) ◽  
pp. 189-196 ◽  
Author(s):  
V. N. Vasyukov ◽  
A. D. Prokhorov ◽  
V. P. D’yakonov ◽  
H. Szymczak

Molecules ◽  
2021 ◽  
Vol 26 (11) ◽  
pp. 3294
Author(s):  
Jakkree Boonlakhorn ◽  
Jedsada Manyam ◽  
Pornjuk Srepusharawoot ◽  
Sriprajak Krongsuk ◽  
Prasit Thongbai

The effects of charge compensation on dielectric and electrical properties of CaCu3Ti4-x(Al1/2Ta1/4Nb1/4)xO12 ceramics (x = 0−0.05) prepared by a solid-state reaction method were studied based on the configuration of defect dipoles. A single phase of CaCu3Ti4O12 was observed in all ceramics with a slight change in lattice parameters. The mean grain size of CaCu3Ti4-x(Al1/2Ta1/4Nb1/4)xO12 ceramics was slightly smaller than that of the undoped ceramic. The dielectric loss tangent can be reduced by a factor of 13 (tanδ ~0.017), while the dielectric permittivity was higher than 104 over a wide frequency range. Impedance spectroscopy showed that the significant decrease in tanδ was attributed to the highly increased resistance of the grain boundary by two orders of magnitude. The DFT calculation showed that the preferential sites of Al and Nb/Ta were closed together in the Ti sites, forming self-charge compensation, and resulting in the enhanced potential barrier height at the grain boundary. Therefore, the improved dielectric properties of CaCu3Ti4-x(Al1/2Ta1/4Nb1/4)xO12 ceramics associated with the enhanced electrical properties of grain boundaries. In addition, the non-Ohmic properties were also improved. Characterization of the grain boundaries under a DC bias showed the reduction of potential barrier height at the grain boundary. The overall results indicated that the origin of the colossal dielectric properties was caused by the internal barrier layer capacitor structure, in which the Schottky barriers at the grain boundaries were formed.


1990 ◽  
Vol 29 (Part 2, No. 11) ◽  
pp. L1977-L1980 ◽  
Author(s):  
Takeshi Takagi ◽  
Fumio Koyama ◽  
Kenichi Iga

2007 ◽  
Vol 76 (21) ◽  
Author(s):  
E. S. Cruz de Gracia ◽  
L. S. Dorneles ◽  
L. F. Schelp ◽  
S. R. Teixeira ◽  
M. N. Baibich

1997 ◽  
Vol 11 (09n10) ◽  
pp. 441-451 ◽  
Author(s):  
Paulo César Miranda Machado ◽  
Francisco A. P. Osório ◽  
A. Newton Borges

The effects of the potential barrier height on the collective excitations of a electron gas confined in a GaAs-AlxGa1-xAs quantum wire of rectangular cross-section are investigated theoretically. For several potential barrier heights, we calculated the plasmon energy, structure factor and pair-correlation function, within the Random-Phase Approximation regime, considering a three-subband model with only the lowest subband populated by electrons. We verified that the intersubband plasmon is more sensitive to the potential barrier height variation than the intrasubband plasmon. We also observed that the confining potential effect decreases with the increasing of the wire-width.


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