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Work Function Tuning through Self-Assembling Monolayers of Fluorinated Molecules
Mapping Intimacies
◽
10.29363/nanoge.ngfm.2019.328
◽
2019
◽
Author(s):
Laura Canil
◽
Antonio Abate
Keyword(s):
Work Function
◽
Self Assembling
◽
Work Function Tuning
Download Full-text
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References
Perovskite Work Function Tuning through Self-Assembling Monolayers
10.29363/nanoge.ngfm.2019.124
◽
2019
◽
Author(s):
Laura Canil
◽
Antonio Abate
Keyword(s):
Work Function
◽
Self Assembling
◽
Work Function Tuning
Download Full-text
Work Function Tuning through Self-Assembling Monolayers of Fluorinated Molecules
10.29363/nanoge.nfm.2019.328
◽
2019
◽
Author(s):
Laura Canil
◽
Antonio Abate
Keyword(s):
Work Function
◽
Self Assembling
◽
Work Function Tuning
Download Full-text
Oxygen incorporation in TiN for metal gate work function tuning with a replacement gate integration approach
Microelectronic Engineering
◽
10.1016/j.mee.2009.10.023
◽
2010
◽
Vol 87
(9)
◽
pp. 1805-1807
◽
Cited By ~ 10
Author(s):
Zilan Li
◽
Tom Schram
◽
Thomas Witters
◽
Joshua Tseng
◽
Stefan De Gendt
◽
...
Keyword(s):
Work Function
◽
Metal Gate
◽
Oxygen Incorporation
◽
Integration Approach
◽
Work Function Tuning
◽
Gate Work Function
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Bottom-up method for work function tuning in high-k/metal gate stacks in advanced CMOS technologies
2011 11th IEEE International Conference on Nanotechnology
◽
10.1109/nano.2011.6144557
◽
2011
◽
Cited By ~ 2
Author(s):
Mrunal A. Khaderbad
◽
Rohit Pandharipande
◽
Aradhana Gautam
◽
Abhishek Mishra
◽
Meenakshi Bhaisare
◽
...
Keyword(s):
Work Function
◽
Gate Stacks
◽
Metal Gate
◽
Bottom Up
◽
High K
◽
Work Function Tuning
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Enabling Effective Work Function Tuning by RFPVD Metal Oxide on High-k Gate Dielectric
ECS Meeting Abstracts
◽
10.1149/ma2008-01/16/632
◽
2008
◽
Keyword(s):
Metal Oxide
◽
Work Function
◽
Gate Dielectric
◽
Effective Work
◽
Effective Work Function
◽
High K
◽
Work Function Tuning
◽
High K Gate Dielectric
Download Full-text
Practical Work Function Tuning Based on Physical and Chemical Nature of Interfacial Impurity in Ni-FUSI/SiON and HfSiON Systems
2006 International Electron Devices Meeting
◽
10.1109/iedm.2006.347005
◽
2006
◽
Cited By ~ 5
Author(s):
Yoshinori Tsuchiya
◽
Masahiko Yoshiki
◽
Motoyuki Sato
◽
Katsuyuki Sekine
◽
Tomohiro Saito
◽
...
Keyword(s):
Work Function
◽
Chemical Nature
◽
Practical Work
◽
Work Function Tuning
◽
Physical And Chemical
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The incorporation of thermionic emission and work function tuning layer into intermediate connecting layer for high performance tandem organic solar cells
Nano Energy
◽
10.1016/j.nanoen.2016.01.002
◽
2016
◽
Vol 21
◽
pp. 123-132
◽
Cited By ~ 17
Author(s):
Shunmian Lu
◽
Xing Guan
◽
Xinchen Li
◽
Jian Liu
◽
Fei Huang
◽
...
Keyword(s):
Solar Cells
◽
Work Function
◽
Organic Solar Cells
◽
High Performance
◽
Thermionic Emission
◽
Work Function Tuning
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Work function tuning of metal nitride electrodes for advanced CMOS devices
Thin Solid Films
◽
10.1016/j.tsf.2005.09.081
◽
2006
◽
Vol 504
(1-2)
◽
pp. 174-177
◽
Cited By ~ 13
Author(s):
C. Ren
◽
B.B. Faizhal
◽
D.S.H. Chan
◽
M.-F. Li
◽
Y.-C. Yeo
◽
...
Keyword(s):
Work Function
◽
Metal Nitride
◽
Work Function Tuning
Download Full-text
Work function tuning at Au-HfO2 interfaces using organophosphonate monolayers
Applied Physics Letters
◽
10.1063/1.4949019
◽
2016
◽
Vol 108
(19)
◽
pp. 191607
◽
Cited By ~ 6
Author(s):
Matthew Kwan
◽
Thomas Cardinal
◽
P. Hubert Mutin
◽
Ganpati Ramanath
Keyword(s):
Work Function
◽
Work Function Tuning
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Solution-Processed LiF for Work Function Tuning in Electrode Bilayers
Nano Letters
◽
10.1021/nl202838a
◽
2011
◽
Vol 12
(1)
◽
pp. 39-44
◽
Cited By ~ 18
Author(s):
Taner Aytun
◽
Ayse Turak
◽
Iain Baikie
◽
Grzegorz Halek
◽
Cleva W. Ow-Yang
Keyword(s):
Work Function
◽
Solution Processed
◽
Work Function Tuning
Download Full-text
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