Growth and characterization of microcrystalline silicon films and devices using very high frequency plasma enhanced chemical vapor deposition

Mapping Intimacies ◽

10.31274/rtd-20200803-197 ◽

2003 ◽

Author(s):

Joshua Ali Graves

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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ERRATA: MICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATURE

International Journal of Modern Physics B ◽

10.1142/s0217979205032310 ◽

2005 ◽

Vol 19 (21) ◽

pp. 3413-3413

Author(s):

ZHIMENG WU ◽

QINGSONG LEI ◽

JIANPING XI ◽

ZHAO YING ◽

XINHUA GENG

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Microstructure characterization of microcrystalline silicon thin films deposited by very high frequency plasma-enhanced chemical vapor deposition by spectroscopic ellipsometry

Thin Solid Films ◽

10.1016/j.tsf.2011.04.166 ◽

2011 ◽

Vol 520 (2) ◽

pp. 861-865 ◽

Author(s):

He Zhang ◽

Xiaodan Zhang ◽

Changchun Wei ◽

Jian Sun ◽

Xinhua Geng ◽

...

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Silicon Thin Films ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Study of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition

Acta Physica Sinica ◽

10.7498/aps.54.1899 ◽

2005 ◽

Vol 54 (4) ◽

pp. 1899

Author(s):

Zhang Xiao-Dan ◽

Zhao Ying ◽

Gao Yan-Tao ◽

Zhu Feng ◽

Wei Chang-Chun ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition

Acta Physica Sinica ◽

10.7498/aps.59.1190 ◽

2010 ◽

Vol 59 (2) ◽

pp. 1190

Author(s):

Ding Yan-Li ◽

Zhu Zhi-Li ◽

Gu Jin-Hua ◽

Shi Xin-Wei ◽

Yang Shi-E ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Deposition Rate ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Ultra-sharp pointed tip Si nanowires produced by very high frequency plasma enhanced chemical vapor deposition via VLS mechanism

Journal of Materials Science ◽

10.1007/s10853-011-5435-6 ◽

2011 ◽

Vol 46 (15) ◽

pp. 5085-5089 ◽

Author(s):

Habib Hamidinezhad ◽

Yussof Wahab ◽

Zulkafli Othaman

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Si Nanowires ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Comparison of Microstructure and Crystal Structure of Polycrystalline Silicon Exhibiting Varied Textures Fabricated by Microwave and Very High Frequency Plasma Enhanced Chemical Vapor Deposition and Their Transport Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.5750 ◽

1999 ◽

Vol 38 (Part 1, No. 10) ◽

pp. 5750-5756 ◽

Author(s):

Toshio Kamiya ◽

Kouichi Nakahata ◽

Kazuyoshi Ro ◽

Charles M. Fortmann ◽

Isamu Shimizu

Keyword(s):

Crystal Structure ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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The effect of deposition pressure on the surface roughness scaling of microcrystalline silicon films by very high frequency plasma-enhanced chemical vapor deposition

2008 33rd IEEE Photovolatic Specialists Conference ◽

10.1109/pvsc.2008.4922801 ◽

2008 ◽

Author(s):

Jinhua Gu ◽

Yanli Ding ◽

Shie Yang ◽

Xiaoyong Gao ◽

Yongsheng Chen ◽

...

Keyword(s):

Surface Roughness ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Deposition Pressure ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Optoelectronic and Structural Properties of Undoped Microcrystalline Silicon Thin Films: Dependence on Substrate Temperature in Very High Frequency Plasma Enhanced Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.3269 ◽

2004 ◽

Vol 43 (6A) ◽

pp. 3269-3274 ◽

Author(s):

Chandan Das ◽

Tapati Jana ◽

Swati Ray

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

Silicon Thin Films ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Vapor Deposition Technique ◽

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Microcrystalline Silicon Solar Cells Fabricated using Array-Antenna-Type Very High Frequency Plasma-Enhanced Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4003 ◽

2006 ◽

Vol 45 (5A) ◽

pp. 4003-4005 ◽

Author(s):

Tomoko Takagi ◽

Masashi Ueda ◽

Norikazu Ito ◽

Yoshimi Watabe ◽

Michio Kondo

Keyword(s):

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Antenna Type ◽

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Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.07.139 ◽

2010 ◽

Vol 518 (8) ◽

pp. 2124-2127 ◽

Author(s):

Doo Sup Hwang ◽

Seung Yoon Lee ◽

Heon Min Lee ◽

Sang Jin Kim ◽

Gil Jun Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Plasma Source ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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