Comparison of Microstructure and Crystal Structure of Polycrystalline Silicon Exhibiting Varied Textures Fabricated by Microwave and Very High Frequency Plasma Enhanced Chemical Vapor Deposition and Their Transport Properties

1999 ◽  
Vol 38 (Part 1, No. 10) ◽  
pp. 5750-5756 ◽  
Author(s):  
Toshio Kamiya ◽  
Kouichi Nakahata ◽  
Kazuyoshi Ro ◽  
Charles M. Fortmann ◽  
Isamu Shimizu
Keyword(s):  
Crystal Structure ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition

2010 ◽  
Vol 518 (8) ◽  
pp. 2124-2127 ◽  
Author(s):  
Doo Sup Hwang ◽  
Seung Yoon Lee ◽  
Heon Min Lee ◽  
Sang Jin Kim ◽  
Gil Jun Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Plasma Source ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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