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Practical Applications of Argon Gas Cluster Ion Beam for X-ray Photoelectron Spectroscopy and Time-of-flight Secondary Ion Mass Spectrometry
Journal of the Vacuum Society of Japan
◽
10.3131/jvsj2.56.348
◽
2013
◽
Vol 56
(9)
◽
pp. 348-354
◽
Cited By ~ 2
Author(s):
Takuya MIYAYAMA
Keyword(s):
Mass Spectrometry
◽
Photoelectron Spectroscopy
◽
Secondary Ion Mass Spectrometry
◽
Ion Beam
◽
Argon Gas
◽
X Ray
◽
Practical Applications
◽
Cluster Ion
◽
Gas Cluster Ion Beam
◽
Secondary Ion
Download Full-text
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Practical Application of Argon Gas Cluster Ion Beam in X-ray Photoelectron Spectroscopy and Time-of-Flight Secondary Ion Mass Spectrometry
Journal of the Japan Society for Precision Engineering
◽
10.2493/jjspe.82.320
◽
2016
◽
Vol 82
(4)
◽
pp. 320-324
Author(s):
Takuya MIYAYAMA
Keyword(s):
Mass Spectrometry
◽
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◽
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Quantitative analysis of lipids with argon gas cluster ion beam secondary ion mass spectrometry
Surface and Interface Analysis
◽
10.1002/sia.5518
◽
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◽
Vol 46
(12-13)
◽
pp. 1129-1132
Author(s):
Makiko Fujii
◽
Shunichirou Nakagawa
◽
Toshio Seki
◽
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◽
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Study on the detection limits of a new argon gas cluster ion beam secondary ion mass spectrometry apparatus using lipid compound samples
Rapid Communications in Mass Spectrometry
◽
10.1002/rcm.6867
◽
2014
◽
Vol 28
(8)
◽
pp. 917-920
◽
Cited By ~ 10
Author(s):
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◽
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◽
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...
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Gas Cluster Ion Beam
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Three-Dimensional Image of Cleavage Bodies in Nuclei Is Configured Using Gas Cluster Ion Beam with Time-of-Flight Secondary Ion Mass Spectrometry
Scientific Reports
◽
10.1038/srep10000
◽
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Author(s):
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Particle-based chemical oscillation as a function of depth in latex films using gas cluster ion beam secondary ion mass spectrometry profiling
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.5024044
◽
2018
◽
Vol 36
(3)
◽
pp. 03E105
Author(s):
Michaeleen L. Pacholski
◽
Zhaohui Qu
◽
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◽
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◽
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Latex Films
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Dose-dependent cesium ion beam damage effects on chemically modified poly(methyl methacrylate) films using secondary ion mass spectrometry and x-ray photoelectron spectroscopy
Analytical Chemistry
◽
10.1021/ac00279a035
◽
1985
◽
Vol 57
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◽
pp. 137-142
◽
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Author(s):
S. J. Simko
◽
D. P. Griffis
◽
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◽
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◽
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◽
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◽
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Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry
Journal of Applied Physics
◽
10.1063/1.4823815
◽
2013
◽
Vol 114
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◽
pp. 124313
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Author(s):
Peter J. Cumpson
◽
Jose F. Portoles
◽
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Exploiting the Semidestructive Nature of Gas Cluster Ion Beam Time-of-Flight Secondary Ion Mass Spectrometry Imaging for Simultaneous Localization and Confident Lipid Annotations
Analytical Chemistry
◽
10.1021/acs.analchem.9b03763
◽
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Vol 91
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Gas Cluster Ion Beam Time-of-Flight Secondary Ion Mass Spectrometry High-Resolution Imaging of Cardiolipin Speciation in the Brain: Identification of Molecular Losses after Traumatic Injury
Analytical Chemistry
◽
10.1021/acs.analchem.7b00164
◽
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◽
Vol 89
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◽
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Investigation of Lithium Insertion Mechanisms of a Thin-Film Si Electrode by Coupling Time-of-Flight Secondary-Ion Mass Spectrometry, X-ray Photoelectron Spectroscopy, and Focused-Ion-Beam/SEM
ACS Applied Materials & Interfaces
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