Anisotropic Single-Crystal Silicon Etching in High-Density RFIC Plasma with High Aspect Ratio and High Selectivity
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2000 ◽
Vol 9
(3)
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pp. 288-294
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2015 ◽
Vol 23
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pp. 1319-1325
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2010 ◽
Vol 163
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pp. 159-163
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