Cylindrical magnetrons with rotating cathodes have found wide
application in the thin-film coating deposition technologies
owing to a higher degree of the target utilization and used
power level as compared with planar magnetrons. The aim of this
work was to increase the efficiency of cylindrical magnetrons.
It is known that the region of uniform coatings deposition with
extended magnetrons is essentially lower than the sputtered
cathode length. The actual achievable cathode utilization degree
is limited, with the regions at cathode ends having a higher
wear rate than the central part. To eliminate these shortcomings,
experiments were carried out on the creation of a magnetic system
to allow an increase of the coating deposition uniformity and
target utilization. Resulting from the investigations that were
carried out, a magnetic system design with an increased magnetic
field at its ends (by 5–15%) and modified turn-around
parts has been developed. This magnetic system design allows
extending the coating deposition region with the uniformity
of ±1% by 12.5 cm and completely eliminating accelerated
erosion of the end cathode parts. The obtained results are
promising for use in technologies of deposition of thin-film
coatings with a high degree of uniformity (no worse than
±1%) onto large-area substrates.
Investigation of the magnetic system design influence on the parameters of the pulses controlling the transfer of the electrode metal
