scholarly journals Effect of Substrate Temperature on Perpendicular Magnetic Anisotropy of Nd-Fe-B Films Prepared by RF sputtering with Subsequent Heat Treatment

2002 ◽  
Vol 2 (2) ◽  
pp. 93-97 ◽  
Author(s):  
L.K.E.B Serrona ◽  
A Sugimura ◽  
R Fujisaki ◽  
T Okuda ◽  
N Adachi ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Magnetic Anisotropy ◽  
Substrate Temperature ◽  
Rf Sputtering ◽  
Perpendicular Magnetic Anisotropy ◽  
Subsequent Heat Treatment

Effects of Interface Roughness and Lattice Strain on Perpendicular Magnetic Anisotropy in Co/Pd Multilayer

2013 ◽  
Vol 534 ◽  
pp. 7-11 ◽  
Author(s):  
Naoto Go ◽  
Kosuke Suzuki ◽  
Shun Emoto ◽  
Masayoshi Itou ◽  
Yoshiharu Sakurai ◽  
...  
Keyword(s):  
Magnetic Anisotropy ◽  
Molecular Beam ◽  
Lattice Strain ◽  
Occupation Number ◽  
Rf Sputtering ◽  
Perpendicular Magnetic Anisotropy ◽  
Interface Roughness ◽  
Magnetic Quantum Number ◽  
Rough Interface ◽  
Number Ratio

The effects of strain and interface roughness at the Co/Pd interface are investigated from the viewpoint of perpendicular magnetic anisotropy (PMA) using the DV-Xα cluster model calculation method. It is found that spin projected occupation number ratio of magnetic quantum number |m| = 2 for the Co 3d electrons enhances by expanding the lattice within a close-packed plane of fcc stacking and, hence, enhances the PMA. Rough interface decreases the spin projected occupation number ratio of |m| = 2 and, hence, decreases the PMA. These results explain the PMA properties of Co/Pd multilayers fabricated using molecular beam epitaxy (MBE) technique and RF sputtering techniques.

Perpendicular Magnetic Anisotropy of Pd/Co and Related Multilayers

1991 ◽  
Vol 231 ◽  
Author(s):  
S. Tsunashima ◽  
K. Nakamura ◽  
H. Takahashi ◽  
S. Fukatsu ◽  
S. Uchiyama
Keyword(s):  
Magnetic Anisotropy ◽  
Noble Metal ◽  
Crystal Orientation ◽  
Rf Sputtering ◽  
Perpendicular Magnetic Anisotropy ◽  
Multilayer Films ◽  
Surface Anisotropy ◽  
View Point ◽  
Magnetoelastic Energy ◽  
Magnetoelastic Surface

AbstractMultilayer films consists of noble metal (Pd, Pt, Cu, Au, PdSi) and transition metal(Co, Ni, PdCo, PtCo, CoZr) layers were prepared by rf sputtering method on glass and/or MgO single crystal substrates. The perpendicular magnetic anisotropy was examined in relation to the magnetostriction, lattice misfits, crystallinity and crystal orientations. The results suggest that the perpendicular magnetic anisotropy in noble metal/PdCo alloy multilayers originates from the magnetoelastic energy of the PdCo layers under a stress due to the lattice misfits. In both Pd/Co and Pd/Ni multilayers, the anisotropy was found to depend on the crystal orientation, and the dependence is discussed from the view point of the magnetoelastic surface anisotropy.

TEM Study of Co/Pd and Co/Au Multilayers

1993 ◽  
Vol 51 ◽  
pp. 1036-1037
Author(s):  
A.E.M. De Veirman ◽  
F.J.G. Hakkens ◽  
W.M.J. Coene ◽  
F.J.A. den Broeder
Keyword(s):  
Magnetic Anisotropy ◽  
Ion Beam ◽  
Perpendicular Magnetic Anisotropy ◽  
Optical Recording ◽  
Magnetic Multilayer ◽  
Ion Beam Sputtering ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Beam Sputtering ◽  
Substrate Temperatures

There is currently great interest in magnetic multilayer (ML) thin films (see e.g.), because they display some interesting magnetic properties. Co/Pd and Co/Au ML systems exhibit perpendicular magnetic anisotropy below certain Co layer thicknesses, which makes them candidates for applications in the field of magneto-optical recording. It has been found that the magnetic anisotropy of a particular system strongly depends on the preparation method (vapour deposition, sputtering, ion beam sputtering) as well as on the substrate, underlayer and deposition temperature. In order to get a better understanding of the correlation between microstructure and properties a thorough cross-sectional transmission electron microscopy (XTEM) study of vapour deposited Co/Pd and Co/Au (111) MLs was undertaken (for more detailed results see ref.).The Co/Pd films (with fixed Pd thickness of 2.2 nm) were deposited on mica substrates at substrate temperatures Ts of 20°C and 200°C, after prior deposition of a 100 nm Pd underlayer at 450°C.

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