Effect of Pole Face Thickness on Magnetization of the Single-pole Magnetic Lens

The scanning transmission electron microscope (STEM) constructed by the authors employs a field emission gun and a 1.15 mm focal length magnetic lens to produce a probe on the specimen. The aperture size is chosen to allow one wavelength of spherical aberration at the edge of the objective aperture. Under these conditions the profile of the focused spot is expected to be similar to an Airy intensity distribution with the first zero at the same point but with a peak intensity 80 per cent of that which would be obtained If the lens had no aberration. This condition is attained when the half angle that the incident beam subtends at the specimen, 𝛂 = (4𝛌/Cs)¼

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Structure images of Si, Ge and Mos2 crystals and some application to radiation damage studies

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010010860x ◽

1978 ◽

Vol 36 (1) ◽

pp. 292-293 ◽

Cited By ~ 1

Author(s):

K. Izui ◽

T. Nishida ◽

S. Furuno ◽

H. Otsu ◽

S. Kuwabara

Keyword(s):

Radiation Damage ◽

Exposure Time ◽

Gaussian Distribution ◽

Intensity Distribution ◽

Chromatic Aberration ◽

Magnetic Lens

Recently we have observed the structure images of silicon in the (110), (111) and (100) projection respectively, and then examined the optimum defocus and thickness ranges for the formation of such images on the basis of calculations of image contrasts using the n-slice theory. The present paper reports the effects of a chromatic aberration and a slight misorientation on the images, and also presents some applications of structure images of Si, Ge and MoS2 to the radiation damage studies.(1) Effect of a chromatic aberration and slight misorientation: There is an inevitable fluctuation in the amount of defocus due to a chromatic aberration originating from the fluctuations both in the energies of electrons and in the magnetic lens current. The actual image is a results of superposition of those fluctuated images during the exposure time. Assuming the Gaussian distribution for defocus, Δf around the optimum defocus value Δf0, the intensity distribution, I(x,y) in the image formed by this fluctuation is given by

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A High Resolution Scanning Microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100101529 ◽

1968 ◽

Vol 26 ◽

pp. 356-357

Author(s):

A. V. Crewe ◽

J. Wall ◽

L. M. Welter

Keyword(s):

High Resolution ◽

Field Emission ◽

Spherical Aberration ◽

Focal Length ◽

Spot Size ◽

Emission Source ◽

Field Of View ◽

Scanning Microscope ◽

Magnetic Lens ◽

High Quality

A scanning microscope using a field emission source has been described elsewhere. This microscope has now been improved by replacing the single magnetic lens with a high quality lens of the type described by Ruska. This lens has a focal length of 1 mm and a spherical aberration coefficient of 0.5 mm. The final spot size, and therefore the microscope resolution, is limited by the aberration of this lens to about 6 Å.The lens has been constructed very carefully, maintaining a tolerance of + 1 μ on all critical surfaces. The gun is prealigned on the lens to form a compact unit. The only mechanical adjustments are those which control the specimen and the tip positions. The microscope can be used in two modes. With the lens off and the gun focused on the specimen, the resolution is 250 Å over an undistorted field of view of 2 mm. With the lens on,the resolution is 20 Å or better over a field of view of 40 microns. The magnification can be accurately varied by attenuating the raster current.

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Performance and applications of the holography electron microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100151222 ◽

1993 ◽

Vol 51 ◽

pp. 1078-1079

Author(s):

Akira Tonomura

Keyword(s):

Electron Beam ◽

Electron Microscope ◽

Phase Measurement ◽

Electron Holography ◽

Imaging Method ◽

High Contrast ◽

Magnetic Lens ◽

High Brightness ◽

Holographic Imaging ◽

Dynamic Observation

Electron holography is a two-step imaging method. However, the ultimate performance of holographic imaging is mainly determined by the brightness of the electron beam used in the hologram-formation process. In our 350kV holography electron microscope (see Fig. 1), the decrease in the inherently high brightness of field-emitted electrons is minimized by superposing a magnetic lens in the gun, for a resulting value of 2 × 109 A/cm2 sr. This high brightness has lead to the following distinguished features. The minimum spacing (d) of carrier fringes is d = 0.09 Å, thus allowing a reconstructed image with a resolution, at least in principle, as high as 3d=0.3 Å. The precision in phase measurement can be as high as 2π/100, since the position of fringes can be known precisely from a high-contrast hologram formed under highly collimated illumination. Dynamic observation becomes possible because the current density is high.

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The Added Value of Graphical Input and Display for Electron Lens Design

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100179701 ◽

1990 ◽

Vol 48 (1) ◽

pp. 190-191

Author(s):

B. Lencova ◽

G. Wisselink

Keyword(s):

Flux Density ◽

Numerical Data ◽

Added Value ◽

Lens Design ◽

Step Size ◽

Magnetic Lens ◽

Flux Lines ◽

Fine Mesh ◽

Electron Lens ◽

User Friendly

Recent progress in computer technology enables the calculation of lens fields and focal properties on commonly available computers such as IBM ATs. If we add to this the use of graphics, we greatly increase the applicability of design programs for electron lenses. Most programs for field computation are based on the finite element method (FEM). They are written in Fortran 77, so that they are easily transferred from PCs to larger machines.The design process has recently been made significantly more user friendly by adding input programs written in Turbo Pascal, which allows a flexible implementation of computer graphics. The input programs have not only menu driven input and modification of numerical data, but also graphics editing of the data. The input programs create files which are subsequently read by the Fortran programs. From the main menu of our magnetic lens design program, further options are chosen by using function keys or numbers. Some options (lens initialization and setting, fine mesh, current densities, etc.) open other menus where computation parameters can be set or numerical data can be entered with the help of a simple line editor. The "draw lens" option enables graphical editing of the mesh - see fig. I. The geometry of the electron lens is specified in terms of coordinates and indices of a coarse quadrilateral mesh. In this mesh, the fine mesh with smoothly changing step size is calculated by an automeshing procedure. The options shown in fig. 1 allow modification of the number of coarse mesh lines, change of coordinates of mesh points or lines, and specification of lens parts. Interactive and graphical modification of the fine mesh can be called from the fine mesh menu. Finally, the lens computation can be called. Our FEM program allows up to 8000 mesh points on an AT computer. Another menu allows the display of computed results stored in output files and graphical display of axial flux density, flux density in magnetic parts, and the flux lines in magnetic lenses - see fig. 2. A series of several lens excitations with user specified or default magnetization curves can be calculated and displayed in one session.

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The Possibilities for Analytical Methods in Photoemission and Low-Energy Electron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100180495 ◽

1990 ◽

Vol 48 (1) ◽

pp. 348-349

Author(s):

Ernst Bauer

Keyword(s):

Chemical Characterization ◽

Emission Angle ◽

Relative Energy ◽

Objective Lens ◽

Chemical Information ◽

Magnetic Lens ◽

Incident Intensity ◽

X Ray ◽

Leed Pattern ◽

Image Position

One of the major shortcomings of conventional PEEM and of LEEM is the lack of chemical information about the surface. Although the imaging of the LEED pattern in the back focal plane of the objective lens of a LEEM instrument allows chemical characterization via the crystalline structure derived from the LEED pattern, this method fails in the absence of a characteristic LEED pattern. Direct information about the atomic composition of the surface is then needed which can be best obtained from inner shell electrons either directly by x-ray-induced photoemission (XPEEM) or by x-ray- or electron-induced Auger electron emission (AEEM). These modes of excitation and imaging can be combined with conventional PEEM and LEEM in one instrument which is presently being developed. Thus a complete structural and chemical characterization becomes possible in one instrument, with parallel detection and high resolution.In contrast to LEEM, in which up to more than 50% of the incident intensity is available for image formation, the intensity of the emitted electrons is much lower in XPEEM and AEEM and the signal is much lower than the background in AEEM. Therefore, intensity I and resolution d have to be optimized simultaneously which is best done by maximizing Q = I/d2 with respect to maximum emission angle α and relative energy distribution ε = ΔVo/V accepted by the instrument. For a well-designed magnetic lens section of the cathode lens its aberrations are determined by the accelerating field F in front of the specimen. For a homogeneous accelerating field F and a cosine emission distribution one obtains for the optimum α and ε values αo,εo a radius of the minimum disc of confusion of

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