scholarly journals Is ortho-Cresol a Viable Lignocellulosic Blendstock? A Kinetic Study of Its Co-Oxidation within a Surrogate Fuel

Energies ◽  
2021 ◽  
Vol 14 (21) ◽  
pp. 7105
Author(s):  
Carolina S. Mergulhão ◽  
Yann Fenard ◽  
Guillaume Vanhove

The viability of the use of ortho-cresol as a bio-blendstock or antiknock additive from lignocellulosic biomass is assessed; Ignition delays of ortho-cresol within blends with iso-octane are measured with the ULille rapid compression machine, and compared with results from the literature; It is shown that ortho-cresol has a strong inhibiting effect on the reactivity towards ignition, most notably in the Negative Temperature Coefficient region; This effect is found to originate from competition with iso-octane on the OH radicals, where the reactivity of ortho-cresol with these radicals does not lead to radical chain-branching.

2018 ◽  
Vol 166 ◽  
pp. 02007
Author(s):  
Qu Yakun ◽  
Long Jun ◽  
Zhou Han

In this paper, the stoichiometric mechanism of gas phase oxidation process of gasoline hydrocarbons was studied through using theoretical stoichiometry. The reason of the phenomenon of cold flame and negative temperature coefficient in the reaction of hydrocarbon molecules before the flame was explained from the molecular level. During the gas phase oxidation process, the alkoxy radical RO· reacts with hydroxyl ·OH to form a relatively stable intermediate such as aldehyde (or ketone) and H2O molecules, and the free radical chain reaction process.The temperature of the reaction process is very low, while the release of a large number of heat, the formation of aldehydes (or ketones) from the excited state back to the ground state when the emission of about 400nm wavelength of light blue fluorescence.


2008 ◽  
Vol 153 (1-2) ◽  
pp. 316-333 ◽  
Author(s):  
S.M. Gallagher ◽  
H.J. Curran ◽  
W.K. Metcalfe ◽  
D. Healy ◽  
J.M. Simmie ◽  
...  

2018 ◽  
Vol 1 (1) ◽  
pp. 21-25
Author(s):  
R Revathi ◽  
R Karunathan

Indium Telluride thin films were prepared by thermal evaporation technique. Films were annealed at 573K under vacuum for an hour. Both as-deposited and annealed films were used for characterization. The structural parameters were discussed on the basis of annealing effect for a film of thickness 1500 Å. Optical analysis was carried out on films of different thicknesses for both as - deposited and annealed samples. Both the as- deposited and annealed films exhibit direct and allowed transition. Electrical resistivity measurements were made in the temperature range of 303-473 K using Four-probe method. The calculated resistivity value is of the order of 10-6 ohm meter. The activation energy value decreases with increasing film thickness. The negative temperature coefficient indicates the semiconducting nature of the film.


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