scholarly journals High-Temperature Oxidation Properties and Microstructural Evolution of Nanostructure Fe-Cr-Al ODS Alloys

Materials ◽  
2021 ◽  
Vol 14 (3) ◽  
pp. 526
Author(s):  
Zhengyuan Li ◽  
Lijia Chen ◽  
Haoyu Zhang ◽  
Siyu Liu

The oxidation behavior and microstructural evolution of the nanostructure of Fe-Cr-Al oxide dispersion strengthened (ODS) alloys prepared by spark plasma sintering were investigated by high-temperature oxidation experiments in air at 1200 °C for 100 h. The formation of Al2O3 scale was observed by X-ray diffraction (XRD) and scanning electron microscopy (SEM) with energy-dispersive X-ray spectroscopy (EDS) line scans. The oxidation rate of Fe-Cr-Al ODS alloys is lower than that of conventional Fe-Cr-Al alloys, and the oxide layer formed on the Fe-Cr-Al alloy appeared loose and cracked, whereas the oxide layer formed on the Fe-Cr-Al ODS alloys was adherent and flat. This is due to the high density of dispersed nano-oxides hindering the diffusion of Al element and the formation of vacancies caused by them. In addition, the nano-oxides could also adhere to the oxide layer. Besides, the microstructure of the Fe-Cr-Al ODS alloy had excellent stability during high-temperature oxidation.

2010 ◽  
Vol 65 ◽  
pp. 106-111
Author(s):  
Bai Cui ◽  
Rafael Sa ◽  
Daniel Doni Jayaseelan ◽  
Fawad Inam ◽  
Michael J. Reece ◽  
...  

Microstructural evolution of Ti2AlN ceramics during high-temperature oxidation in air has been revealed by X-ray diffraction (XRD), field emission gun scanning electron microscopy (FEGSEM), and energy-dispersive spectroscopy (EDS). After oxidation below 1200 °C, layered microstructures formed on Ti2AlN surfaces containing anatase, rutile, and α-Al2O3. Above 1200 °C, more complex layered microstructures formed containing Al2TiO5, rutile, α-Al2O3, and continuous void layers. With increasing temperature, anatase gradually transformed to rutile, and TiO2 reacted with α-Al2O3 to form Al2TiO5. Based on these microstructural observations, an oxidation mechanism for Ti2AlN ceramics is proposed.


Coatings ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 540 ◽  
Author(s):  
Bih-Show Lou ◽  
Yue-Chyuan Chang ◽  
Jyh-Wei Lee

The high temperature oxidation performance of nitride thin films has become an important issue when they are used as protective coatings on dry cutting tools or on die casting molds. In this study, the high temperature oxidation behaviors of CrNx and Cr-Si-N thin films were investigated at 1000 °C for 6 h in ambient air. The CrNx and Cr-Si-N thin films were prepared by a bipolar asymmetric pulsed direct-current (DC) magnetron sputtering system. Cr-Si-N films with silicon content ranging from 3.9 to 12.2 at.% were deposited by adjusting the Si target power. A thermogravimeter was adopted to study the oxidation kinetics of thin films. The weight gains were measured to calculate the parabolic rate constants of thin films. X-ray diffraction, X-ray mapping, and Auger electron spectroscopy were employed to study the microstructure and elemental redistributions of oxidized thin films. The as-deposited CrNx and Cr-Si-N thin films consisted of CrN and Cr2N mixed phases. The faceted Cr2O3 surface oxides, porous inner oxide layer, and oxygen-containing CrSi2 phases were found for the CrN film after oxidation test. On the other hand, the Cr-Si-N film containing 12.2 at.% Si showed a dense surface oxide layer and a thick and compact nitride layer, which indicates its best oxidation resistance. The high temperature oxidation resistance of Cr-Si-N thin films was improved by increasing Si content, due to the amorphous matrix contained nanocomposite microstructure and the formation of amorphous silicon oxide to retard the diffusion paths of oxygen, chromium, silicon, and nitrogen. The lowest parabolic rate constant of 1.48 × 10–2 mg2/cm4/h was obtained for the 12.2 at.% Si contained Cr-Si-N thin films, which provided the best oxidation resistance at 1000 °C for 6 h in this work. It should be noted that the residual tensile stress of thin film had a detrimental effect on the adhesion property during the oxidation test.


2014 ◽  
Vol 216 ◽  
pp. 79-84
Author(s):  
Carsten Strübbe ◽  
Gabriela Marginean ◽  
Viorel Aurel Serban

The high temperature oxidation behaviour of Ni-Cr-B-Si coatings with a higher Si-content was investigated in order to evaluate the suitability of such materials especially for novel applications concerning highly aggressive environments like metal dusting. Metal dusting is a corrosion phenomenon that occurs in reducing-, carbon-supersaturated (ac>1) gaseous atmosphere, containing CO, H2, CO2 and H2O, at elevated temperatures between 400 and 800°C. Metal dusting reactions can be classified into two types. The first one concerns Fe-alloys, where Fe3C is growing on the surface. The second one is related to the reaction of Ni, Co and their alloys, where the destruction takes place through inward growth or direct ingrowth of graphite, without forming the metastable Fe3C. Regarding to the literature, metal dusting is typically encountered in industrial furnaces, but mainly in the chemical or petrochemical industry. The way to suppress metal dusting is to stop the dissociation of the carbon source or to stop the carbon ingress in the material. One possibility in order to avoid the carburization of Fe, Ni, Co and their alloys is to preoxidize the samples. Based on the reducing atmosphere, where metal dusting occurs, the isothermal outsourcing for the formation of a protective Al-, Cr- or Si-oxide layer on the samples in air is mostly necessary. The role of a stable Al2O3 and Cr2O3-layer on the sample as a diffusion barrier against the carbon ingress, based on their low solubility for carbon, has already been investigated and proved by many scientists. The formation of a protective and thermodynamically very stable SiO2 scale was also investigated. Within the scope of this work, the influence of a higher Si-content (4,5 wt%) in NiCrBSi-alloys, depending on the temperature, was analyzed. For this purpose the samples were oxidized in air at 600, 700 and 800°C respectively. The surface morphology and the phase composition of the grown oxide scales were characterized by means of scanning electron microscopy combined with energy dispersive X-ray (SEM/EDX) and by X-ray diffraction (XRD) technique. The experimental results demonstrate the importance of silicon content on the coatings properties, respectively on the stability of the formed oxide scale (free of micro cracks, no spallation). This element is able to form beside chromium, a dense oxide layer on the sample surface, protecting it against further degradation induced by the atmosphere in different high temperature applications. Moreover, the increased chromium content of the feedstock powder (from 10 wt% in previous work to 12,5 wt%) demonstrated that the Ni-Cr-B-Si coatings exposed at 600°C, 700°C as well as at 800°C were not susceptible to internal oxidation.


2007 ◽  
Vol 471 (1-2) ◽  
pp. 69-74 ◽  
Author(s):  
R.A. Saucedo-Acuña ◽  
H. Monreal-Romero ◽  
A. Martínez-Villafañe ◽  
J.G. Chacon-Nava ◽  
U. Arce-Colunga ◽  
...  

2012 ◽  
Vol 60 (3) ◽  
pp. 1079-1092 ◽  
Author(s):  
Bai Cui ◽  
Rafael Sa ◽  
Daniel D. Jayaseelan ◽  
Fawad Inam ◽  
Michael J. Reece ◽  
...  

2013 ◽  
Vol 45 (3) ◽  
pp. 1401-1408 ◽  
Author(s):  
Giovanni Pulci ◽  
Jacopo Tirillò ◽  
Francesco Marra ◽  
Fabrizio Sarasini ◽  
Alessandra Bellucci ◽  
...  

2020 ◽  
Vol 321 ◽  
pp. 05018
Author(s):  
Eri Miura-Fujiwara ◽  
Yuya Ogawa ◽  
Mitsuo Niinomi ◽  
Tohru Yamasaki

The authors proposed an oxide coating on Ti alloys for the dental abutment tooth, and they had reported that Ti–29Nb–13Ta–4.6Zr (TNTZ) alloy forms a dense oxide layer by high-temperature oxidation. On the other hand, CP Ti forms a multilayered oxide consisted of rutile monolayers and the void layer. This morphological change by alloying is supposed to be mainly caused by Nb addition in Ti since the dense oxide layer of TNTZ mainly consists of rutile TiO2 and TiNb2O7. Therefore, in this study, oxidation behaviors of various range of Nb content of Ti-xNb alloys (x = 1 ~ 32 mol%) were investigated, and exfoliation resistance was evaluated. And in this paper, the oxide/metal interfacial microstructure of oxidized CP Ti, TNTZ alloy, and Ti-Nb alloy was studied by a transmission electron microscopy (TEM) and by a scanning transmission electron microscopy with an electron dispersive spectroscopy (STEM-EDS). The cross-sectional observations suggested that the substrate was gradually oxidized during heat treatment, and nucleation and grain growth of TiO2 and TiNb2O7 proceed at the metal/oxide interface. Consequently, the gradual oxidation process in TNTZ and Ti-Nb alloys could lead to its continuous interfacial microstructure and dense oxide structure, which can achieve high exfoliation resistance.


2013 ◽  
Vol 761 ◽  
pp. 125-129 ◽  
Author(s):  
Kazuya Hamaguchi ◽  
Tomoyuki Tsuchiyama ◽  
Junichi Matsushita

Tantalum (Ta) can be use a suture for operation and implant material in order not to react with body fluid and stimulate a human body. In this study, the stable oxide of a tantalum, tantalum oxide layer produced by oxidation of the tantalum nitride, TaN powders by high temperature oxidation were investigated in order to determine the possibility of its a distributed aid for biomaterial composite such as an artificial root etc. The sample, TaN powder oxidized at high temperature exhibited a steady mass gain with increasing oxidation temperature. Based on the results of the XRD, tantalum oxide, Ta2O5 was detected on the samples. It is considered, the TaN showed a good oxidation film produced by high temperature oxidation.


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