scholarly journals Optimization of Shape, Size and Material of Plasmonic Nano Particles in Thin Film Solar Cell

2020 ◽  
Vol 7 (11) ◽  
pp. 390-393
Author(s):  
Asad ullah ◽  
◽  
Fazal E Hilal ◽  

In this study we present optimized shape, size and material of plasmonic nanoparticles in thin film solar cell. For this purpose, we chose silicon active layer solar cell, on the top of active layer another layer of silicon dioxide was used as antireflection coating. Thickness of ARC layer was kept 71nm. On the top of ARC layer metallic nanoparticles were placed. Parameters of NP’s such as shape, size and material were varied. Respective variations in the absorption of light in the active silicon layer were observed respectively. Absorption patterns were plotted against wavelength range of 400nm to 1400nm of incident light radiation using Finite Element Method (FEM). Results revealed the most optimized size and shape of nanoparticles that can contribute to the absorption of light in the active layer of the solar cell. Results also distinguished the best material for nanoparticle.

2011 ◽  
Vol 2011 ◽  
pp. 1-4 ◽  
Author(s):  
Hyukyong Kwon ◽  
Jaedoo Lee ◽  
Minjeong Kim ◽  
Soohong Lee

Solar cell is device that directly converts the energy of solar radiation to electrical energy. So it is important for solar cell to reduce the surface reflection of light in order to improve the efficiency of the device. Texturing and antireflection coating have been used to reduce the reflection of light. Texturing technology has reduced the 10% of incident light. However, there are a few disadvantages of random pyramid texturing that the results are not always reproducible in an industrial environment. And AR coating (MgF2, ZnS) is difficult to apply the standard industrial process because high vacuum is needed and the expense is very heavy. This paper investigates the formation of a thin film of porous silicon on the surface of crystalline silicon substrate without other AR coating layers. The formation of the porous silicon layer was measured with SEM (scanning electron microscopy). The formation of porous silicon layers on the textured silicon wafer resulted in lower than 5% of reflectance in the wavelength region from 400 to 1000 nm.


2013 ◽  
Vol 669 ◽  
pp. 194-203
Author(s):  
Hong Zhou ◽  
Xiao Ping Huang ◽  
Lei Zhong ◽  
Sheng Kang Ji ◽  
Yan Pang ◽  
...  

We simulate and calculate numerically the electromagnetic field and energy flux in single crystal silicon thin film solar cell coated with silver nano-disk square array by using the finite-difference time-domain (FDTD) method. Because of the surface plasmon resonance (SPR) of silver nano array, the electromagnetic field is redistributed and enhanced in the solar cell. The simulation results show that the electromagnetic field distribution and corresponding energy flux component depend on the nano array and the structure of absorbed layer in solar cell. The wavelength of the incident light relative to the nano array determine the profile of the electric field around the nano array. The electromagnetic field distribution in thin film is determined by the internal structure of solar cell. For different incident wavelengths, the electromagnetic field distribution in solar cell will changes. The energy flux named as Poynting vector also changes with the incident wavelength. To investigate the absorption of the solar cell, the normalized absorbed power at different wavelengths is calculated. Based on the SPR effect, the solar cell exhibts absorption enhancement sharply at a certain wavelength.


2001 ◽  
Vol 67 (1-4) ◽  
pp. 41-47 ◽  
Author(s):  
Toshihiko Toyama ◽  
Toshihiro Suzuki ◽  
Masahiro Gotoh ◽  
Kyotaro Nakamura ◽  
Hiroaki Okamoto

2007 ◽  
Vol 124-126 ◽  
pp. 987-990 ◽  
Author(s):  
Jeong Kim ◽  
Sang Wook Park ◽  
In Sik Moon ◽  
Moon Jae Lee ◽  
Dae Won Kim

An Electrochemical etching was used to form the porous silicon (PS) layer on the surface of the crystalline silicon wafer. The PS layer, in this study, will act as an antireflection coating to reduce the reflection of the incident light into the solar cell. The etching solution (electrolyte) was prepared by mixing HF (50%) and ethanol which was introduced for efficient bubble elimination on the silicon surface during etching process. The anodization of the silicon surface was performed under a constant current (galvanostat mode of the power supply), and process parameters, such as current density and etching time, were carefully tuned to minimize the surface reflectance of the heavily-doped wafer with sheet resistance between 20-30 / .


2009 ◽  
Vol 1153 ◽  
Author(s):  
Rana Biswas ◽  
Dayu Zhou ◽  
Luis Garcia

AbstractLight management and enhanced photon harvesting is a critical area for improving efficiency of thin film solar cells. Red and near infrared photons with energies just above the band edge have large absorption lengths in amorphous silicon and can not be efficiently collected. We previously demonstrated that a photonic crystal back reflector involving a periodically patterned ZnO layer can enhance absorption of band edge photons. We propose and design alternative new plasmonic crystal structures that enhance absorption in thin film solar cell structures. These plasmonic crystals consist of a periodically patterned metal back reflector with a periodic array of holes An amorphous/nanocrystalline silicon layer resides on top of this plasmonic crystal followed by a standard anti-reflecting coating. We have found plasmonic crystal structures enhance average photon absorption by more than 10%, and by more than a factor of 10 at wavelengths just above the band edge, and should lead to improved cell efficiency. The plasmonic crystal diffracts band edge photons within the absorber layer, increasing their path length and dwell time. In addition there is concentration of light within the plasmonic crystal. Design simulations are performed with rigorous scattering matrix simulations where both polarizations of light are accounted for.


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