scholarly journals Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

2013 ◽  
Vol 4 ◽  
pp. 638-648 ◽  
Author(s):  
Tatjana Ladnorg ◽  
Alexander Welle ◽  
Stefan Heißler ◽  
Christof Wöll ◽  
Hartmut Gliemann
Keyword(s):  
Atomic Force Microscopy ◽  
Metal Organic Frameworks ◽  
Selective Growth ◽  
Self Assembled Monolayer ◽  
Mercaptopropionic Acid ◽  
Force Microscopy ◽  
Atomic Force ◽  
Metal Organic ◽  
Self Assembled ◽  
Site Selective

Surface anchored metal-organic frameworks, SURMOFs, are highly porous materials, which can be grown on modified substrates as highly oriented, crystalline coatings by a quasi-epitaxial layer-by-layer method (liquid-phase epitaxy, or LPE). The chemical termination of the supporting substrate is crucial, because the most convenient method for substrate modification is the formation of a suitable self-assembled monolayer. The choice of a particular SAM also allows for control over the orientation of the SURMOF. Here, we demonstrate for the first time the site-selective growth of the SURMOF HKUST-1 on thiol-based self-assembled monolayers patterned by the nanografting technique, with an atomic force microscope as a structuring tool. Two different approaches were applied: The first one is based on 3-mercaptopropionic acid molecules which are grafted in a 1-decanethiolate SAM, which serves as a matrix for this nanolithography. The second approach uses 16-mercaptohexadecanoic acid, which is grafted in a matrix of an 1-octadecanethiolate SAM. In both cases a site-selective growth of the SURMOF is observed. In the latter case the roughness of the HKUST-1 is found to be significantly higher than for the 1-mercaptopropionic acid. The successful grafting process was verified by time-of-flight secondary ion mass spectrometry and atomic force microscopy. The SURMOF structures grown via LPE were investigated and characterized by atomic force microscopy and Fourier-transform infrared microscopy.

scholarly journals Crystal growth of the core and rotated epitaxial shell of a heterometallic metal-organic framework revealed with atomic force microscopy

2021 ◽  
Author(s):  
Fajar Inggit Pambudi ◽  
Michael William Anderson ◽  
Martin Attfield
Keyword(s):  
Atomic Force Microscopy ◽  
Crystal Growth ◽  
Metal Organic Framework ◽  
Metal Organic Frameworks ◽  
Force Microscopy ◽  
The Core ◽  
Atomic Force ◽  
Metal Organic ◽  
Surface Crystal ◽  
Organic Framework

Atomic force microscopy has been used to determine the surface crystal growth of two isostructural metal-organic frameworks, [Zn2(ndc)2(dabco)] (ndc = 1,4-naphthalene dicarboxylate, dabco = 4-diazabicyclo[2.2.2]octane) (1) and [Cu2(ndc)2(dabco)] (2) from...

Comparative Study of Field Emission-Scanning Electron Microscopy and Atomic Force Microscopy to Assess Self-assembled Monolayer Coverage on Any Type of Substrate

1999 ◽  
Vol 5 (6) ◽  
pp. 413-419 ◽  
Author(s):  
Bernardo R.A. Neves ◽  
Michael E. Salmon ◽  
Phillip E. Russell ◽  
E. Barry Troughton
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Comparative Study ◽  
Field Emission ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Self Assembled ◽  
Scanning Electron

Abstract: In this work, we show how field emission–scanning electron microscopy (FE-SEM) can be a useful tool for the study of self-assembled monolayer systems. We have carried out a comparative study using FE-SEM and atomic force microscopy (AFM) to assess the morphology and coverage of self-assembled monolayers (SAM) on different substrates. The results show that FE-SEM images present the same qualitative information obtained by AFM images when the SAM is deposited on a smooth substrate (e.g., mica). Further experiments with rough substrates (e.g., Al grains on glass) show that FE-SEM is capable of unambiguously identifying SAMs on any type of substrate, whereas AFM has significant difficulties in identifying SAMs on rough surfaces.

Adhesion and Friction at Graphene/Self-Assembled Monolayer Interfaces Investigated by Atomic Force Microscopy

2017 ◽  
Vol 121 (10) ◽  
pp. 5635-5641 ◽  
Author(s):  
Meagan B. Elinski ◽  
Benjamin D. Menard ◽  
Zhuotong Liu ◽  
James D. Batteas
Keyword(s):  
Atomic Force Microscopy ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Self Assembled

Atomic Force Microscopy of Self-Assembled Nanostructures of TPPS4 on SAM Substrates

2004 ◽  
Vol 97-98 ◽  
pp. 195-200 ◽  
Author(s):  
R. Augulis ◽  
R. Valiokas ◽  
B. Liedberg ◽  
R. Rotomskis
Keyword(s):  
Atomic Force Microscopy ◽  
Substrate Surface ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Polar Groups ◽  
Atomic Force ◽  
Adsorption Of Organic Molecules ◽  
J Aggregates ◽  
Self Assembled ◽  
Highly Correlated

The adsorption of organic molecules on solid surfaces is one of the fundamental processes for the development of molecular-based nanodevices. Here we focus on the adsorption and ordering of the TPPS4-based J-aggregates on silicon and gold as well as on self-assembled monolayer (SAM) surfaces. The SAMs used for the experiments were based on the chemisorption of thiol containing compounds onto gold. Long ω-substituted alkanethiols are spontaneously assembled on gold to form highly ordered and densely packed layers with controllable chemical and physical properties. TPPS4 J-aggregates were dispersed on SAM surfaces, and on plain gold and silicon substrates for comparison. The dimensions of aggregates, measured by means of atomic force microscopy, varied depending on the type of substrate. Long stripe-like aggregates were flattened on the substrate surface, and the height and width of aggregates highly correlated with the polarity of surface groups. For example, the J-aggregates were narrower on hydrophobic substrates (with non-polar groups) and wider on hydrophilic substrates (with polar groups). These observations support the hypothesis, that TPPS4 forms .soft. cylindrical aggregates, that appear flattened on the substrate.

Production of Nanopatterns by a Combination of Electron Beam Lithography and a Self-Assembled Monolayer for an Antibody Nanoarray

2007 ◽  
Vol 7 (2) ◽  
pp. 410-417 ◽  
Author(s):  
Guo-Jun Zhang ◽  
Takashi Tanii ◽  
Yuzo Kanari ◽  
Iwao Ohdomari
Keyword(s):  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
High Specificity ◽  
Nonspecific Binding ◽  
Self Assembled Monolayer ◽  
Incubation Condition ◽  
Force Microscopy ◽  
Atomic Force ◽  
Self Assembled

We report on a flexible method of producing antibody (IgG) nanopatterns by combining electron beam (EB) lithography and a perfluorodecyltriethoxysilane (FDTES) self-assembled monolayer (SAM). Using EB lithography of the FDTES SAM, we easily fabricated IgG patterns with feature sizes on the order of 100 nm. The patterned IgG retained its ability to interact specifically with an anti-IgG. The influence of different concentrations of the IgG and anti-IgG on the resulting fluorescent IgG arrays was investigated. These IgG nanopatterns appeared to be remarkably well controlled and showed almost no detectable nonspecific binding of proteins on a hydrophobic SAM under a suitable incubation condition, characterized by atomic force microscopy, and epi-fluorescence microscopy. The technique enables the realization of high-throughput protein nanoscale arrays with high specificity.

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