Research on Film Thickness Uniformity of Electron Beam Evaporation Spherical Fixture System

2021 ◽  
Vol 58 (5) ◽  
pp. 0531001-531001327
Author(s):  
潘永刚 Pan Yonggang ◽  
刘政 Liu Zheng ◽  
王奔 Wang Ben ◽  
张四宝 Zhang Sibao ◽  
吕辰瑞 Chenrui Lü
1984 ◽  
Vol 40 ◽  
Author(s):  
J. T. Wetzel ◽  
D. A. Smith ◽  
G. Appleby-Mougham

AbstractCopper was deposited by electron beam evaporation onto both freshly cleaved bare and polyimide-coated (001) NaCl at substrate temperatures of 20°, 100°, 200° and 300°C at rates of 2 and 20,Åsec−1. For all substrate temperatures and deposition rates investigated, the Volmer-Weber mode of film growth was observed for copper both on polyimide and on NaCl. Comparisons of film growth on the two substrates for a constant substrate temperature revealed differences in film thickness at which copper became continuous or formed a completely coalesced film. It was found that copper grown on polyimide formed continuous and completely coalesced films at smaller film thicknesses than on NaCI. However once a completely coalesced film was obtained, grain growth in the copper films proceeded more rapidly on NaC1 substrates than on polyimide substrates.


2019 ◽  
Vol 33 (04) ◽  
pp. 1950034 ◽  
Author(s):  
Bassam Abdallah ◽  
Koutayba Alnama ◽  
Fareza Nasrallah

Deposition of Zinc sulfide (ZnS) thin films on Si (100) and glass substrates has been performed using electron beam evaporation (EBE) method without annealing. Film structure has been analyzed by XRD, while SEM and AFM have been used to explore the films morphology. Raman spectroscopy has been used to confirm film composition. The stoichiometry has been verified by EDX and XPS techniques. XRD patterns indicated that the films possess a polycrystalline cubic structure with orientations along (111) and (220) planes. The crystallinity has been better with film thickness in the 350–1700 nm range while the RMS roughness increases. Optical properties of the grown films were characterized by optical transmittance measurements (UV–Vis). The deduced energy band gap of the films shows a clear reduction from 3.45 eV to 3.36 eV with increasing film thickness. The evolution of refractive index, extinction coefficient, and dielectric constants with thickness has been investigated from transmittance spectra in the 500–1000 nm wavelength range.


Author(s):  
George C. Ruben

Single molecule resolution in electron beam sensitive, uncoated, noncrystalline materials has been impossible except in thin Pt-C replicas ≤ 150Å) which are resistant to the electron beam destruction. Previously the granularity of metal film replicas limited their resolution to ≥ 20Å. This paper demonstrates that Pt-C film granularity and resolution are a function of the method of replication and other controllable factors. Low angle 20° rotary , 45° unidirectional and vertical 9.7±1 Å Pt-C films deposited on mica under the same conditions were compared in Fig. 1. Vertical replication had a 5A granularity (Fig. 1c), the highest resolution (table), and coated the whole surface. 45° replication had a 9Å granulartiy (Fig. 1b), a slightly poorer resolution (table) and did not coat the whole surface. 20° rotary replication was unsuitable for high resolution imaging with 20-25Å granularity (Fig. 1a) and resolution 2-3 times poorer (table). Resolution is defined here as the greatest distance for which the metal coat on two opposing faces just grow together, that is, two times the apparent film thickness on a single vertical surface.


1985 ◽  
Vol 131 (3-4) ◽  
pp. 261-266 ◽  
Author(s):  
M. Denhoff ◽  
B. Heinrich ◽  
A.E. Curzon ◽  
S. Gygax

2007 ◽  
Vol 201 (13) ◽  
pp. 6078-6083 ◽  
Author(s):  
C. Rebholz ◽  
M.A. Monclus ◽  
M.A. Baker ◽  
P.H. Mayrhofer ◽  
P.N. Gibson ◽  
...  

2018 ◽  
Vol 765 ◽  
pp. 3-7
Author(s):  
Badin Damrongsak ◽  
Samutchar Coomkaew ◽  
Karnt Saengkaew ◽  
Ittipon Cheowanish ◽  
Pongsakorn Jantaratana

In this work, magnetic force microscopy (MFM) tips coated with a nickel thin-film were prepared and characterized for applications in the measurement of the magnetic write field. Nickel films with various thicknesses in a range of 20 – 80 nm were deposited on silicon substrates and silicon atomic force microscopy (AFM) tips by electron beam evaporation. Film surface morphologies and magnetic properties of the coated nickel films were investigated by using AFM and vibrating sample magnetometry (VSM). The rms roughness increased with the film thickness and was in a range between 0.1 and 0.3 nm. VSM results revealed that the mean coercive field of the nickel films was 20 Oe and there was an increase in the coercivity as the film thickness increased. In addition, the prepared MFM tips were evaluated for the tip response to the dc and ac magnetic field generated from perpendicular write heads. It was found that the MFM tip had the best response to the write field when coated with 60 nm thick nickel film. The coating thickness over 60 nm was inapplicable due to the cantilever bending caused by the film stress.


1990 ◽  
Vol 29 (5) ◽  
pp. 1068-1073 ◽  
Author(s):  
G. A. Ozin ◽  
Mark P. Andrews ◽  
C. G. Francis ◽  
H. X. Huber ◽  
K. Molnar

Sign in / Sign up

Export Citation Format

Share Document