Plasma Liquid-Vapor Activation (PLVA) Effect of the Semiconductor Etching Process for Photoresist Residues

2008 ◽  
Vol 53 (3) ◽  
pp. 1375-1378 ◽  
Author(s):  
Soo In Kim ◽  
Chang Woo Lee
Keyword(s):  
Etching Process ◽  
Semiconductor Etching ◽  
Liquid Vapor

scholarly journals An Elementary Model for Control of a Semiconductor Etching Process

SIAM Review ◽  
2002 ◽  
Vol 44 (4) ◽  
pp. 678-695
Author(s):  
A. Madhukar ◽  
T. Parent ◽  
I. G. Rosen ◽  
C. Wang
Keyword(s):  
Etching Process ◽  
Elementary Model ◽  
Semiconductor Etching

A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

1977 ◽  
Vol 31 (3) ◽  
pp. 201-207 ◽  
Author(s):  
W. R. Harshbarger ◽  
R. A. Porter ◽  
T. A. Miller ◽  
P. Norton
Keyword(s):  
Silicon Nitride ◽  
Plasma Etching ◽  
Spectroscopic Analysis ◽  
Etching Rate ◽  
Plasma Chemistry ◽  
Optical Emission ◽  
Etching Process ◽  
Semiconductor Materials ◽  
Rf Plasma ◽  
Semiconductor Etching

Spectroscopic analysis of optical emission during rf plasma etching of semiconductor materials has been used to gain a better understanding of the plasma chemistry involved in these systems. The emission was studied principally in CF4-O2 gas mixtures, but other gases were observed as well. It is known that the addition of a relatively small percentage of O2 to CF4 yields a much faster etching rate for silicon and silicon nitride. With the addition of 02 to CF4 discharges we have studied emission from atomic O and molecular CO with a large increase in the emission of atomic F. When the plasma is actively etching silicon or silicon nitride, the emission intensities of both F and O atoms are significantly lower. The etching process can be monitored by observing the intensities of these lines. Analysis of the emission features has also been used to determine abnormal conditions which can adversely affect the etching process.

Sem Observations in Gastric Mucosa Exposed to Progressive Enzymatic Etching

1980 ◽  
Vol 38 ◽  
pp. 570-571
Author(s):  
C.A.E. Lemmi ◽  
D. Booth ◽  
G.E. Adomian
Keyword(s):  
Gastric Mucosa ◽  
Critical Point ◽  
Proteolytic Activity ◽  
Etching Process ◽  
Cellular Types

In order to enrich populations of homogeneous cellular types we dissociated gastric mucosa by enzymatic techniques. In addition, we used SEM to monitor the progressive etching of the mucosa. Two enzymes were tested: collagenase III with minimum proteolytic activity and Pronase with broader proteolytic effects. The gastric mucosa was exposed to the effect of the enzymes using everted stomach preparations. In this way the digestive action occured progressively from the lumen of the stomach toward the base of the glands. This “etching” process could be monitored conveniently by SEM. After incubation for periods varying from 30 to 210 minutes the tissues were stretched on dental wax, fixed in 2 % glutaralheyde, post-fixed in osmium, dehydrated, critical point dryed and coated with gold. A model MSM-5 “Mini-SEM” was used for observation. Gentle uncurling of the preparation before coating with gold produced fractures which revealed the structure of the gastric glandsin more detail.

Stability of an Interface in a Liquid-Vapor System

2002 ◽  
Vol 33 (3-4) ◽  
pp. 4
Author(s):  
S. N. Syromyatnikov ◽  
P. A. Pavlov
Keyword(s):  
Liquid Vapor
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