Effects of oxygen plasma treatments on the work function of indium tin oxide studied by in-situ photoelectron spectroscopy

2016 ◽  
Vol 68 (5) ◽  
pp. 692-696 ◽  
Author(s):  
Minjae Maeng ◽  
Ji-Hoon Kim ◽  
Jong-Am Hong ◽  
Yongsup Park
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Oxygen Plasma ◽  
Plasma Treatments

An angular dependent X-ray photoemission study of Indium-tin-oxide surfaces

2002 ◽  
Vol 747 ◽  
Author(s):  
H. H. Fong ◽  
W. J. Song ◽  
S. K. So
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Surface Band ◽  
Band Bending ◽  
X Ray ◽  
Plasma Treatments ◽  
Photoemission Study ◽  
Uv Ozone

ABSTRACTThe surface properties of indium-tin-oxide (ITO) thin films treated by UV ozone or plasma were analyzed by angular dependent X-ray photoelectron spectroscopy (ADXPS) and by ultraviolet photoemission (UPS). The chemical composition, chemical states and the work function of the ITO surfaces were deduced. Our analysis indicate that ITO surface is Sn-rich. Both UV ozone and O-plasma treatments are most effective in removing surface hydrocarbon. Among all treatments, O-plasma treated surface achieved the highest work function of 4.4eV, whereas argon ion sputtered surface had the lowest work function of 3.9eV. Both O-plasma and UV ozone treatments increase the surface oxygen concentration. It is proposed that O2-ions diffuse into ITO. The diffusion length is about 50Å as deduced from ADXPS. The stoichiometry of the surface is the major factor in controlling the surface work function of ITO. A surface band bending model is proposed to account for the change of work function due to “oxidized” ITO surface after UV-ozone or oxygen plasma treatments.

Work Function Modification of Indium–Tin Oxide by Surface Plasma Treatments Using Different Gases

2009 ◽  
Vol 48 (2) ◽  
pp. 021601 ◽  
Author(s):  
Kang-Pil Kim ◽  
A. Mohammed Hussain ◽  
Dae-Kue Hwang ◽  
Sung-Ho Woo ◽  
Hong-Keun Lyu ◽  
...  
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Surface Plasma ◽  
Plasma Treatments ◽  
Different Gases

scholarly journals In Situ Measurements of Work Function of Indium Tin Oxide after UV/Ozone Treatment

2015 ◽  
Vol 56 (9) ◽  
pp. 1445-1447 ◽  
Author(s):  
Daisuke Yamashita ◽  
Atsushi Ishizaki ◽  
Tomoyuki Yamamoto
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ozone Treatment ◽  
Uv Ozone

Interplay of cleaning and de-doping in oxygen plasma treated high work function indium tin oxide (ITO)

2012 ◽  
Vol 13 (10) ◽  
pp. 2028-2034 ◽  
Author(s):  
Irfan Irfan ◽  
Sachiko Graber ◽  
Franky So ◽  
Yongli Gao
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxygen Plasma ◽  
High Work Function ◽  
High Work

Work Function Enhancement of Indium Tin Oxide via Oxygen Plasma Immersion Ion Implantation

2013 ◽  
Vol 15 (8) ◽  
pp. 791-793 ◽  
Author(s):  
Huanzhong Gao ◽  
Long He ◽  
Zhijiang He ◽  
Zebin Li ◽  
Zhonghang Wu ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxygen Plasma ◽  
Plasma Immersion Ion Implantation

Work function of indium tin oxide transparent conductor measured by photoelectron spectroscopy

1996 ◽  
Vol 68 (19) ◽  
pp. 2699-2701 ◽  
Author(s):  
Y. Park ◽  
V. Choong ◽  
Y. Gao ◽  
B. R. Hsieh ◽  
C. W. Tang
Keyword(s):  
Work Function ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Transparent Conductor

SURFACE PROPERTIES OF INDIUM-TIN-OXIDE MODIFIED BY OXYGEN PLASMA IMMERSION ION IMPLANTATION

2013 ◽  
Vol 06 (02) ◽  
pp. 1350020 ◽  
Author(s):  
LONG HE ◽  
ZHONGHANG WU ◽  
KONGDUO HE ◽  
XIAOXUAN FAN ◽  
ZEBIN LI ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Work Function ◽  
Surface Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxygen Plasma ◽  
Surface Work ◽  
Plasma Immersion Ion Implantation ◽  
Surface Work Function ◽  
Ito Films

Indium tin oxide (ITO) was modified by oxygen inductive coupled plasma (O-ICP) and oxygen plasma immersion ion implantation (O-PIII) respectively to compare the effects of both techniques on the surface properties. X-ray photoelectron spectroscopy (XPS) was applied to characterize the electronic state of ITO surface. The oxygen content enhancement and band bending at the surface of ITO were found after treatment by both O-ICP and O-PIII. The surface work function of ITO thin film depends on the oxygen composition at the surface. A surface work function increment of 0.8 eV by O-PIII was estimated from the shift of O1s core levels to low binding energy, which was the double of that by O-ICP. The conductivity increment of ITO films was less than 1% after O-ICP and O-PIII treatment. The transparency of ITO films increased by about 1% resulted from surface texture by O-PIII sputtering.

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